Asml Holding N.v.

Asml Netherlands B.v.

Richard John Johnson

Robert Gabriël Maria Lansbergen

George Hilary Harrold

Hugo Jacobus Gerardus Van Der Weijden

Frits Van Der Meulen

James Hamilton Walsh

Christopher Rossi Vann

Eric Bernard Westphal

Jeremy Rex Heaston

An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.

Apparatus for and method cleaning a support inside a lithography apparatus

Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Rapid exchange device for lithography reticles

Provided is a method to load a patterning device () onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device () onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device () are substantially in contact and coplanar.

Shared compliance in a rapid exchange device for reticles, and reticle stage

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Danbury, CT, United States of America

Richard John Johnson