Infineon Technologies Ag

Qimonda Ag

Infineon Technologies LLC

Richard Johannes Luyken

Franz Hofmann

Michael Specht

Wolfgang Roesner

Erhard Landgraf

Till Schloesser

Franz Kreupl

Thomas Schulz

Wolfgang Rösner

Johannes Kretz

Steve Wood

Georg Braun

Anthony Sanders

Dirk Scheideler

Edoardo Prete

Hans-Peter Trost

Rolf Weis

Lothar Risch

Dirk Manger

Marc Strasser

Andrew Graham

Roland Thewes

Hermann Ruckerbauer

Werner Weber

Christian Pacha

Hans-Peter Moll

Roland Irsigler

Till Schl&ouml;sser

Martin Popp

Thomas Peter Haneder

Till Schlösser

Wolfgang R&ouml;sner

Wolfgang Rosner

Wolfgang Hönlein

Joachim Nuetzel

Jessica Hartwich

Wolfgang H&ouml;nlein

Peng-Fei Wang

Martin Städele

Martin Staedele

Markus Seitz

Carsten Niepelt

Gurkan Ilicali

An apparatus for providing a signal for transmission via a signal line includes a controller circuit having an output for a signal indicating whether the signal line is or will be in an inactive state and a switching circuit coupled to the controller circuit and having an output coupled to the signal line. The output is switched between different signal levels, if the signal indicates that the signal line is in an inactive state.

Apparatus and method for providing a signal for transmission via a signal line

An integrated circuit including a gate electrode is disclosed. One embodiment provides a transistor including a first source/drain electrode and a second source/drain electrode. A channel is arranged between the first and the second source/drain electrode in a semiconductor substrate. A gate electrode is arranged adjacent the channel layer and is electrically insulated from the channel layer. A semiconductor substrate electrode is provided on a rear side. The gate electrode encloses the channel layer at least two opposite sides.

Integrated circuit including a gate electrode

An apparatus being connectable as a latch stage into a asynchronous latch chain comprises a reception interface, wherein upon receipt of the first signal at the reception interface, the apparatus switches to one of the first power saving mode and a second power saving mode, depending on the second signal at the reception interface and wherein the apparatus offers a first power consumption and a first wake-up time in the first power saving mode, and a second power consumption and a second wake-up time in the second power saving mode.

Apparatus and method for switching an apparatus to a power saving mode

A fin field effect transistor arrangement comprises a substrate and a first fin field effect transistor on and/or in the substrate. The first fin field effect transistor includes a fin in which a channel region is formed between a first source/drain region and a second source/drain region and above which a gate region is formed. A second fin field effect transistor is provided on and/or in the substrate including a fin in which a channel region is formed between a first source/drain region and a second source/drain region and above which a gate region is formed. The second fin field effect transistor is arranged laterally alongside the first fin field effect transistor, wherein a height of the fin of the first fin field effect transistor is greater than a height of the fin of the second fin field effect transistor.

Fin field effect transistor arrangement and method for producing a fin field effect transistor arrangement

A semiconductor device having a stacked arrangement of a substrate and a first chip and a second chip is disclosed. In one embodiment, the first chip is arranged with a lower face on an upper face of the substrate; the second chip with a lower face on an upper face of the first chip, whereby a partial area of the upper face of the first chip that is adjacent to an edge of the first chip is uncovered by the second chip; a fifth wire contact pad is arranged on the uncovered area of the upper face of the first chip; a first bonding wire is arranged that is connected with a first wire contact pad of the substrate and the fifth wire contact pad of the first chip.

Semiconductor device

A nanotube array and a method for producing a nanotube array. The nanotube array has a substrate, a catalyst layer, which includes one or more subregions, on the surface of the substrate and at least one nanotube arranged on the surface of the catalyst layer, parallel to the surface of the substrate. The at least one nanotube being arranged parallel to the surface of the substrate results in a planar arrangement of at least one nanotube. Therefore, the nanotube array of the invention is suitable for coupling to conventional silicon microelectronics. Therefore, according to the invention it is possible for a nanotube array to be electronically coupled to macroscopic semiconductor electronics. Furthermore, the nanotube array according to the invention may have an electrically insulating layer between the substrate and the catalyst layer. This electrically insulating layer preferably has a topography which is such that the at least one nanotube rests on the electrically insulating layer at its end sections and is uncovered in its central section. As a result of the surface of the at least one nanotube being partly uncovered, the uncovered surface of the nanotube can be used as an active sensor surface. For example, the uncovered surface of the nanotube can come into operative contact with an atmosphere which surrounds the nanotube array. The electrical resistance of a nanotube changes significantly in the presence of certain gases. Thus because the nanotube is clear and uncovered, the nanotube array can be used in many sensor applications.

Nanotube array and method for producing a nanotube array

Substrate having a first partial substrate with a carrier layer and a second partial substrate, which is bonded to the first partial substrate. The second partial substrate has an insulator layer, which is applied on the carrier layer and has at least two regions each having a different thickness, thereby forming a stepped surface of the insulator layer, and a semiconductor layer, which is applied to the stepped surface of the insulator layer and is formed at least partially epitaxially, wherein the semiconductor layer has a planar surface which is opposite to the stepped surface of the insulator layer. Transistors are formed on the semiconductor layer.

Method for producing a substrate

In a method for producing a trench transistor, a substrate of a first conduction type is provided and a trench in the substrate and a gate dielectric in the trench are formed. A first conductive filling in the trench as a gate electrode on the gate dielectric and first source and drain regions are formed. An etched-back first conductive filling is produced by etching back the first conductive filling down to a depth below the first source and drain regions and second source and drain regions are formed. The second source and drain regions adjoin the first source and drain regions and extend to a depth at least as far as the etched-back first conductive filling. An insulation spacer above the etched-back first conductive filling is formed in the trench and a second conductive filling is provided in the trench as an upper part of the gate electrode.

Method for producing a trench transistor and trench transistor

A semiconductor memory component comprises at least one memory cell. The memory cell comprises a semiconductor body comprised of a body region, a drain region and a source region, a gate dielectric, and a gate electrode. The body region comprises a first conductivity type and a depression between the source and drain regions, and the source and drain regions comprise a second conductivity type. The gate electrode is arranged at least partly in the depression and is insulated from the body, source, and drain regions by the gate dielectric. The body region further comprises a first continuous region with a first dopant concentration and a second continuous region with a second dopant concentration greater than the first dopant concentration. The first continuous region adjoins the drain region, the depression and the source region, and the second region is arranged below the first region and adjoins the first region.

Semiconductor memory component with body region of memory cell having a depression and a graded dopant concentration

An integrated circuit arrangement and fabrication method is presented. The integrated circuit arrangement contains a semiconductor and a metal electrode. The contact area between a semiconductor and the electrode is increased without increasing the lateral dimensions using partial regions of the semiconductor and/or of the electrode that extend through a transition layer between the semiconductor and electrode.

Integrated circuit arrangement with low-resistance contacts and method for production thereof

A method of manufacturing a transistor. In one embodiment, the method includes forming a gate electrode by defining a gate groove in the substrate. A plate-like portion is defined in each of the trenches at a position adjacent to the groove so that the two plate-like portions will be connected with the groove and the groove is disposed between two plate-like portions. In one embodiment, the two plate-like portions are defined by an etching process which selectively etches the isolating material of the isolation trenches with respect to the semiconductor substrate material. A gate insulating material is provided at an interface between the active area and the groove and the interface between the active area and the plate-like portions, and a gate electrode material is deposited so as to fill the groove and the two plate-like portions.

Method of manufacturing a transistor and a method of forming a memory device with isolation trenches

An apparatus interfaces a first circuit using a first supply voltage and a second circuit using a second supply voltage different from the first supply voltage. The apparatus includes a driver circuit having a driver network comprising driver supply voltage terminals connected to controllable switches. The controllable switches include resistive elements or are separated from resistive elements. A receiver circuit has a receiving network comprising a resistive element and receiver supply voltage terminals and a connection line connecting the driver circuit and the receiving circuit. The controllable switches have two switch configurations, a first switch configuration resulting in a high voltage on the connection line and a second switch configuration resulting in a low voltage on the connection line.

Concept for interfacing a first circuit requiring a first supply voltage and a second supply circuit requiring a second supply voltage

A DRAM memory cell is provided with a selection transistor, which is arranged horizontally at a semiconductor substrate surface and has a first source/drain electrode, a second source/drain electrode, a channel layer arranged between the first and the second source/drain electrode in the semiconductor substrate, and a gate electrode, which is arranged along the channel layer and is electrically insulated from the channel layer, a storage capacitor, which has a first capacitor electrode and a second capacitor electrode, insulated from the first capacitor electrode, one of the capacitor electrodes of the storage capacitor being electrically conductively connected to one of the source/drain electrodes of the selection transistor, and a semiconductor substrate electrode on the rear side, the gate electrode enclosing the channel layer at at least two opposite sides.

DRAM memory cell

The invention relates to a process for producing a layer arrangement, in which, a porous silicon layer is formed as sacrificial layer on an auxiliary substrate, a first semiconductor layer is formed on the sacrificial layer, a first electrically insulating layer is formed on the first semiconductor layer, an electrically conductive layer is formed on the first electrically insulating layer, which electrically conductive layer is laterally patterned, the first electrically insulating layer, the sacrificial layer and the first semiconductor layer are jointly laterally patterned using the laterally patterned electrically conductive layer as a mask, a semiconductor structure is formed adjacent to side walls of the patterned sacrificial layer and of the patterned first semiconductor layer, a substrate is secured over the patterned electrically conductive layer, material of the auxiliary substrate is removed, so that the sacrificial layer is uncovered, the sacrificial layer is selectively removed, so as to form a trench, and a second electrically insulating layer is formed in the trench, then an electrically conductive structure is formed on this second electrically insulating layer.

Process for producing a layer arrangement, and layer arrangement for use as a dual gate field-effect transistor

An integrated read-only memory having select transistors, each of which has a drain connection and an electrode connection for feeding an electrical signal such as a voltage or a current. A layer is provided between the drain connections and the electrode, whose electric resistance can be changed under the effect of a configuration voltage or current. The layer may be applied in a backend process.

Integrated read-only memory, method for operating said read-only memory and corresponding production method

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Munich, Germany

Richard Johannes Luyken