American Air Liquide, Inc.

Other

L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

Air Liquide Electronics U.S. LP

Richard J Udischas

Hwa-Chi Wang

Joseph E Paganessi

Benjamin Jurcik

Denis Muller

Robert G Irwin

Benjamin J Jurcik

Werner Schleser

Nathan Stafford

Shinji Tomita

Kazuo Yokogi

Mindi Xu

Carol Ann Schnepper

Benjamin J Jurcik, Jr

The present invention provides for an integrated valve regulator assembly that comprises an integral body having a base portion that includes an axis for mounting on and coaxially with the neck portion of a pressurized source vessel and an assembly outlet, a defined internal passage in the integral body that extends through and between the base portion of the integral body and the assembly outlet, a sub-atmospheric pressure regulator assembled within the integral body of the integrated valve regulator assembly, an isolation valve positioned within the defined internal passage of the integral body and located downstream from and in communication with the sub-atmospheric pressure regulator, and a filling port disposed between the axis for mounting on and coaxially with the neck portion of the pressurized source vessel and the sub-atmospheric pressure regulator. The present invention further provides for a system for the controlled storage and dispensing of a hazardous material at sub-atmospheric pressure that comprises a pressurized source vessel and the integrated valve regulator assembly of the present invention. The present invention further provides for an additional integrated valve regulator assembly as described with the exception that the pressure regulator utilized is for super-atmospheric pressure conditions and also a system that comprises a pressurized source vessel and the integrated valve regulator assembly that includes a super-atmospheric pressure regulator.

Integrated valve regulator assembly and system for the controlled storage and dispensing of a hazardous material

Methods of purifying HSe by removing HS and/or HO are disclosed. The amount of HS in the HSe-containing gas is reduced below 10 ppmv by passing the HSe-containing gas through an AW-500 molecular sieve. HS and HO are removed by passing HSe through a 4 A molecular sieve and subsequently passing HSe through an AW-500 molecular sieve.

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Provided is a novel system for vaporizing and purifying a gas to produce ultrapure chemical gases employed at a semiconductor processing facility. The system includes a liquified gas source, a vaporization purification bed, and a buffer tank. The liquefied gas source is in communication with the vaporization purification bed to provide a liquefied gas to the bed with an ultra-pure chemical gas generated in the purification bed. The purified gas is subsequently routed to a buffer tank and to a point of use therefrom.

System and method for purifying and distributing chemical gases

Provided is a novel system and method for delivery of gas from a liquefied state. The system includes (a) a delivery vessel holding a bulk quantity of liquefied gas therein; (b) a heat exchanger disposed on the delivery vessel to provide or remove energy from the liquefied gas only; and (c) a pressure controller for monitoring and adjusting the energy delivered to the vessel. The system and method allow for controlled delivery of liquefied gas from a delivery vessel at a predetermined flow rate. Particular applicability is found in the delivery of gases to semiconductor process tools.

System and method for controlled delivery of liquefied gases from a bulk source

Provided is a novel system for delivery of a gas from a liquefied state. The system includes: (a) a cabinet having a first and second panel disposed therein; (b) at least one compressed liquefied gas cylinder corresponding to each panel disposed in the cabinet; (c) temperature and/or pressure sensors disposed on each the cylinder; and (d) a controller for monitoring and adjusting the energy input into each of the cylinders based on the temperature and/or pressure in each of the cylinders sensed by the temperature and/or pressure sensors.

System and method for controlled delivery of liquefied gases including control aspects

Provided are a novel system and method for delivery of a vapor phase product to a point of use, as well as a novel on-site chemical distribution system and method. The system for delivery of a vapor phase product includes a storage vessel containing a liquid chemical under its own vapor pressure, a column connected to receive the chemical in liquified state from the storage vessel, wherein the chemical is fractionated into a contaminated liquid heavy fraction and a purified light vapor fraction and a conduit connected to the column for removing the purified light vapor fraction therefrom. The system is connected to the point of use for introducing the purified vapor fraction thereto. Particular applicability is found in semiconductor manufacturing in the delivery of electronic specialty gases to one or more semiconductor processing tools.

System and method for delivery of a vapor phase product to a point of use

Provided is a novel system and method for delivery of a gas from a liquified state. The system includes: (a) a compressed liquified gas cylinder having a gas line connected thereto through which the gas is withdrawn; (b) a gas cylinder cabinet in which the gas cylinder is housed; and (c) means for increasing the heat transfer rate between ambient and the gas cylinder without increasing the temperature of the liquid in the gas cylinder above ambient temperature. The apparatus and method allow for the controlled delivery of liquified gases from gas cabinets at high flowrates. Particular applicability is found in the delivery of gases to semiconductor process tools.

System and method for controlled delivery of liquified gases

Provided are a novel system and method for delivery of a vapor phase product to a point of use, as well as a novel on-site chemical distribution system and method. The system for delivery of a vapor phase product includes a storage vessel containing a liquid chemical under its own vapor pressure, a column connected to receive the chemical in liquified state from the storage vessel, wherein the chemical is fractionated into a contaminated liquid heavy fraction and a purified light vapor fraction and a conduit connected to the column for removing the purified light vapor fraction therefrom. The system is connected to the point of use for introducing the purified vapor fraction thereto. Particular applicability is found in semiconductor manufacturing in the delivery of electronics specialty gases to one or more semiconductor processing tools.

A system and a method for analyzing impurities in compressed gas, a method for controlling the particle growth in the monitored gas and a method for determining the optimum monitoring temperature for an individual gas are disclosed.

Method to analyze particle contaminants in compressed gases

Provided is a portable system useful for sampling both particulate and vapor phase metallic impurities from gases that cannot by hydrolyzed. The system comprises a valve for introducing and controlling the exhaust of the gas to be sampled from the system. The metallic impurities are entrapped on a filter, with one filter being operated at ambient temperature to remove particulate metallic impurities, and with another filter being operated at a temperature below ambient in order to remove vapor phase metallic impurities. In operating the system, the system is first back-filled to create a pressure equilibrium across the valve which introduces the gas to the first filter. The flow of gas through the entire sampling system is controlled by means of a critical orifice located between the filter and the valve for controlling exhaust of the gas from the system. The entire system is portable and allows for transport of the system with its filters to a laboratory in order to permit the most sophisticated and effective analysis of the metallic impurities in the filters under controlled laboratory conditions.

Metal sampling method and system for non-hydrolyzable gases

Provided is a novel system and method for delivery of a gas from a liquified state. The system includes: (a) a compressed liquified gas cylinder having a gas line connected thereto through which the gas is withdrawn; (b) a gas cylinder cabinet in which the gas cylinder is housed; and (c) means for increasing the heat transfer rate between ambient and the gas cylinder without increasing the gas cylinder temperature above ambient temperature. The apparatus and method allow for the controlled delivery of liquified gases from gas cabinets at high flowrates. Particular applicability is found in the delivery of gases to semiconductor process tools.

A system and a method for analyzing impurities in compressed gas, a method for controlling the particle growth in the monitored gas and a method for determining the optimum monitoring temperature for an individual gas are disclosed. The system includes a source of compressed gas, a sensor for measuring particle impurity within the gas, a temperature controller for controlling the temperature of the gas prior to said gas entering the sensor, with the temperature being controlled to eliminate particle formation from molecular clustering and condensation, and a pressure balancer.

Provided is a portable system useful for sampling both particulate and vapor phase metallic impurities from gases that cannot by hydrolyzed. The system comprises valves for introducing and controlling the exhaust of the gas to be sampled from the system. The metallic impurities are entrapped on filters, with one filter being operated at ambient temperature to remove particulate metallic impurities, and with another filter being operated at a temperature below ambient in order to remove vapor phase metallic impurities. In operating the system, the system is first back-filled to create a pressure equilibrium across the valve which introduces the gas to the first filter means. The flow of gas through the entire sampling system is controlled by means of a critical orifice located between the filters and the valve for controlling exhaust of the gas from the system. The entire system is portable and allows for transport of the system with its filters to a laboratory in order to permit the most sophisticated and effective analysis of the metallic impurities in the filters under controlled laboratory conditions.

A device and a method for its use for the removal of contaminants from a gas cylinder valve assembly. The valve assembly output is fed to the device which in turn has inlet and outlet connections to receive and to pass purge gas therethrough. The device is sized and positioned so that contaminants can be purged and a vacuum drawn from the gas cylinder valve assembly at the assembly location itself thus increasing the efficiency of contaminant removal.

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Chicago, IL, United States of America

Richard J Udischas