United Technologies Corporation

Richard J Fenton

Robert J Wright

Ralph J Hecht

Robert E Hendricks

Kenneth S Murphy

Sputtering techniques are utilized to form an aluminum rich diffusion coating on the surface of a superalloy substrate. The coating contains additions of oxygen active elements, such as yttrium, and the coating has an outward diffusion aluminide microstructure obtained by carrying the sputtering process out at temperatures in the range of about 1,010.degree.-1,150.degree. C.

Method for applying diffusion aluminide coating

A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a fully dense material. The container is then partially removed from the target material except for a remnant around the outer surface. A cooling jacket is then fabricated and attached to the remnant of the container.

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Glastonbury, CT, United States of America

Richard J Fenton