Advanced Micro Devices Corporation

Richard J Bartlett

Anthony P Coniglio

Khoi A Phan

Martin Mazur

Jeffrey P Erhardt

Jerry Cheng

Wolfram Grundke

Daniel E Sutton

Carol M Bradway

Mikkel Lantz

David A Steele

John T Shea

Valerie Guinan

A remote track editor system, method, and computer readable medium is provided to remotely edit track flows and recipes of semiconductor processing tools. The editor system includes a processing track, a track controller, and a remote track editor for remotely editing recipes of at least one semiconductor processing tool. The editor system communicates with remote terminals and accesses multiple flows and recipes stored on network databases through a SECS/GEM interface. The remote track editor edits recipes without interrupting the process track and correctly renumbers line and flow numbers of the recipes when editing, deleting, or inserting steps. The remote track editor also performs side-by-side comparisons of multiple recipes, verifies the contents of recipes to master recipes, and provides indicators of mismatches.

Remote wafer flow and recipe editor for simiconductor processing control

Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein, including special vapor prime and development operations.

Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process

Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein. The method may comprise employing an anti reflective coating prior to applying a photo resist coating in a semiconductor manufacturing process. Also disclosed are methodologies for exhausting resist residue during development via a rinsing fluid.

An approach for managing a manufacturing process is provided. A specification and recipe management system (RSMS) manages the validation of new specifications that reference one or more recipes and one or more contexts stored in a recipe management system (RMS). The validation of new specifications includes verifying that RMS code blocks contained in the new specification can be processed by the RMS. Also, the versions of recipes and contexts referenced in the specification are checked to ensure that they are either the current, valid version number or a valid new version number. The RSMS provides a specification browser for examining cross-reference information for specifications, recipes and contexts. The cross-reference information specifies recipes and contexts referenced in a selected specification, subject to a recipe/context filter. In addition, the cross-reference information identifies specifications that reference a selected recipe or a selected context, subject to a specification filter. A project editor allows specifications, recipes and contexts to be grouped into projects for release. The versions of recipes and context referenced by the specifications contained in the project are compared to ensure that the same version of a recipe is referenced by all of the specifications in a project and that all specification referencing changing recipes or contexts are in the project.

Validating process data in manufacturing process management

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Bonny Doon, CA, United States of America

Richard J Bartlett