Optical Coating Laboratory, Inc.

Jds Uniphase Corporation

Other

Viavi Solutions Inc.

Richard Ian Seddon

Michael D Temple

Michael A Scobey

James W Seeser

Paul M LeFebvre

Markus K Tilsch

Georg J Ockenfuss

Kim L Johnson

Barry W Manley

Eric R Dickey

Bryant P Hichwa

Jeremy Hayes

David L Soberanis

Richard James Ryall

Basil L Swaby

Thomas H Allen

Scott E Solberg

Robert F Klinger

Rolf F Illsley

Craig C Van Horn

Patrick R Wentworth

Charles Andrew Hulse

James D Rancourt

Erik W Anthon

Andrew Thomas Taylor

William T Beauchamp

Robert E Klinger

Nils H Bergfelt

Robert E Hahn

John D Sonderman

Bradley James Pond

Ralf Erz

R Russel Austin

Russell Edward Barbaria

A sputtering anode is disclosed wherein the anode is in the form of a container or vessel; and, wherein the conducting surface communicating with a cathode is the inside surface of the container or vessel. The anode can be mounted outside of a coating chamber having its opening communicating with the chamber or alternatively may be mounted within the chamber. The anode may be an inlet port for receiving inert gas for use in forming the plasma and for pressurizing the anode.

Anode for sputter coating

The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.

Magnetron sputtering device

A device for mounting and removing a substrate from a baseplate, in particular a substrate holder assembly device, including automated features for latching and unlatching a substrate, for use in a coating mechanism, from a baseplate, which includes an adjustable snap ring holder.

Substrate holder assembly device

A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.

Cathode for sputter coating

The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The substrate holder includes a reusable base formed, at least partially, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, which encourages adherence of coating material and has a low vapor pressure at coating temperatures.

Substrate holder for a vapour deposition system

The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.

Magnetic latch for a vapour deposition system

A thermally stabilized optical filter device includes a multilayer optical bandpass filter on a transparent substrate, with the transparent substrate being composed of a material having a first coefficient of thermal expansion. An encasement surrounds the transparent substrate such that the bandpass filter is exposed for transmission of predetermined optical wavelengths there through. The encasement is composed of a material having a second coefficient of thermal expansion that is different than the first coefficient of thermal expansion. The encasement provides thermal stability to the optical properties of the bandpass filter by compensating for changes in the filter that occur with temperature variations. In another embodiment, a collet assembly provides means for selectively compressing a filter chip to tune the filter response.

Extrinsically athermalized optical filter devices

An optical switch for use in optical telecommunication applications is configured to tolerate vibration and shock loading, preserving optical alignment at a plurality of switching positions and during the switching operation, and to effectively perform precise and accurate switching operations in a variety of environmental conditions. Switching operations are performed when an actuator that responds to a switching stimulus acts upon a flexure pivot device that in turn accurately and reproducibly displaces an optical element that operates upon a light signal.

Optical switch with flexure pivot

A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Geometries and configurations for magnetron sputtering apparatus

A process suitable for forming multi-layer (up to at least several hundred layers) monotonic/linear variable/wedge filter coatings on a single substrate surface and for forming monolithic filter assemblies which incorporate such filters, is disclosed along with the designs for such filters. The monolithic process uses radially variable filter fabrication techniques in combination with ion-assisted deposition to form stress controlled, radially variable filter coatings of the desired varied optical profile, preferably using high and low index materials stich as tantala and silica. Stress is minimized by balancing the amount of ion assist and the coating rate. Slices are cut radially from the substrate to form quasi-linear variable filters. Other coatings such as, but not limited to, a wide band hot mirror can be formed on the opposite surface of the substrate from the radially variable LVF method. The method forms complex multi-layer thick filters with high yields on a single substrate surface such that the filter is free of precession or sideways leakage of light between the parallel surfaces. Also disclosed is an optical filter having stacks arranged so that the magnitude of the characteristic center wavelength of each stack increases from stack to stack along the desired direction of traversal of incident light through the filter. As a result of this sequential construction, diffuse leaks are blocked from transmission through the filter. The diffuse leak-suppressed filter can be formed by various processes, including the monolithic process.

Monolithic linear variable filter and method of manufacture

A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Process for depositing optical thin films on both planar and non-planar

The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.

Methods for preparing low scatter optical coatings

Process for depositing optical films on both planar and non-planar

A leak-corrected linearly variable filter comprises optical filter coatings formed on an assembly of one or more optically transmissive substrates. Leaks due to the longitudinal precession of incident light within the substrates are suppressed by forming the filter such that no two surfaces which are reflected at the same wavelength within the range of interest are parallel. Typically, the constituent substrates of the filter are oriented at a slight angle relative to one another and filter coatings having overlapping reflective wavelengths are deposited on different substrates rather than on the two parallel sides of the same substrate. Alternatively, venetian shade structures can be incorporated within the substrates to block longitudinal precession of light.

Leakage-corrected linear variable filter

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Santa Rosa, CA, United States of America

Richard Ian Seddon