Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Carl Zeiss Smt Gmbh

Richard Henricus Adrianus Van Lieshout

Ruud Antonius Catharina Maria Beerens

Theodorus Petrus Maria Cadee

Jan Van Eijk

Wilhelmus Henricus Theodorus Maria Aangenent

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Nicolaas Ten Kate

Engelbertus Antonius Fransiscus Van Der Pasch

Johannes Petrus Martinus Bernardus Vermeulen

Andre Bernardus Jeunink

Koen Jacobus Johannes Maria Zaal

Johannes Hendrikus Maria Spruit

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Stig Bieling

Olav Waldemar Vladimir Frijns

Antonius Theodorus Wilhelmus Kempen

Theo Anjes Maria Ruijl

Alexander Matthijs Struycken

Johannes Antonius Gerardus Akkermans

Robertus Mathijs Gerardus Rijs

Henricus Martinus Johannes Van De Groes

Stan Henricus Van Der Meulen

Sander Christiaan Broers

Marinus Maria Johannes Van De Wal

Ivo Vanderhallen

Rob Johan Theodoor Rutten

Hendrikus Johannes Schellens

Cristian Dan

Bo Lenssen

Adrianus Marinus Wouter Heeren

Jeroen Johannes Theodorus Hendrikus De Best

George Alois Leonie Leenknegt

Lucas Franciscus Koorneef

Marcus Petrus Scheepers

Peter Van Der Krieken

Stanley Constant Johannes Martinus Van Den Berg

Pieter Hubertus Godefrida Wullms

Saartje Willemijn Van Der Hoeven

A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

Sensor, object positioning system, lithographic apparatus and device manufacturing method

A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Radiation collector, radiation source and lithographic apparatus

A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.

Stage positioning system and lithographic apparatus

A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.

Stage system and lithographic apparatus comprising such stage system

A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

Stage system and a lithographic apparatus

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Positioning system, lithographic apparatus and device manufacturing method

Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.

Lithographic apparatus with a deformation sensor

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Batenburg, Netherlands

Richard Henricus Adrianus Van Lieshout