Micron Technology Incorporated

Intel Corporation

Stmicroelectronics S.r.l.

Richard Edward Fackenthal

Duane R Mills

Ferdinando Bedeschi

Durai Vishak Nirmal Ramaswamy

Kamal M Karda

Meenatchi Jagasivamani

Haitao Liu

Daniele Vimercati

Karthik Sarpatwari

Enzo M Donze

Angelo Visconti

Jahanshir J Javanifard

Ravi Annavajjhala

Fatma Arzum Simsek-Ege

Eric S Carman

Simone Lombardo

Simon J Lovett

John Rudelic

Aswin Thiruvengadam

William A Melton

Ruili Zhang

Mauro Bonanomi

Charles L Ingalls

Sean Stephen Eilert

Mingdong Cui

Xinwei Guo

Alessandro Calderoni

Mamun Ur Rashid

Christian Caillat

Matthew G Dayley

Saad Monasa

Rod Rozman

Paolo Amato

Claudio Resta

Giulio Casagrande

Christophe Laurent

Yasuko Hattori

Sujaya Srinivasan

David Dressler

Patrick Wu

Andrea Fantini

A microelectronic device comprises a vertical stack of memory cells. The vertical stack of memory cells comprises a vertical stack of access devices, a vertical stack of capacitors horizontally neighboring the vertical stack of access devices, a conductive pillar structure in electrical communication with the vertical stack of access devices, and an isolated conductive structure in electrical communication with a multiplexer comprising a vertically uppermost access device of the vertical stack of access devices. The microelectronic device further comprises a stack structure comprising conductive structures interleaved with insulative structures, at least some of the conductive structures individually in electrical communication with a memory cell of the vertical stack of memory cells and comprising a gate of an access device of the vertical stack of access devices. Related electronic systems and methods are also described.

Microelectronic devices, related electronic systems, and methods of forming microelectronic devices

A microelectronic device comprises vertical stacks of memory cells, each vertical stack of memory cells comprising a vertical stack of access devices, a vertical stack of capacitors horizontally neighboring the vertical stack of access devices, and a conductive pillar structure vertically extending through the vertical stack of access devices. The microelectronic device further comprises multiplexers and additional transistors vertically overlying the vertical stacks of memory cells, and global digit lines vertically overlying the multiplexer and the additional transistor. Related electronic systems and methods are also described.

Methods, systems, and devices for thin film transistor random access memory are described. A memory device may include memory cells each having one or more transistors formed above a substrate. For example, a memory cell may include a transistor having a channel portion formed by one or more pillars or other structures formed above a substrate, and a gate portion including a conductor formed above the substrate and configured to activate the channel portion based at least in part on a voltage of the gate portion. A memory cell may include a set of two or more such transistors to support latching circuitry of the memory cell, or other circuitry configured to store a logic state, which may or may not be used in combination with one or more transistors formed at least in part from one or more portions of a substrate.

Thin film transistor random access memory

Methods, systems, and devices for source line configurations for a memory device are described. In some cases, a memory cell of the memory device may include a first transistor having a floating gate for storing a logic state of the memory cell and a second transistor coupled with the floating gate of the first transistor. The memory cell may be coupled with a word line, a digit line, and a source line. During a write operation, the source line may be clamped to the digit line using one or more memory cells in the memory device. During a read operation, the source line may be grounded using one or more memory cells in the memory device.

Source line configuration for a memory device

Systems, methods, and apparatus related to data recovery in memory devices. In one approach, a memory device encodes stored data. The memory device reads a codeword from a storage media and determines that a number errors in the codeword exceeds an error correction capability of the memory device. The errors are due, for example, to one or more stuck bits. In response to this determination, one or more data patterns are written to the storage media at the same address from which the codeword is read. The data patterns are read to identify bit locations of the stuck bits. The identified locations are used to correct bit errors of the read codeword that correspond to the identified locations. The corrected code word is sent to a host device (e.g., which requested data from the memory device using a read command).

Data recovery system for memory devices

Some embodiments include apparatuses and methods of operating such apparatuses. One of such apparatuses includes a data line, a conductive region, and a memory cell including a first transistor and a second transistor. The first transistor includes a first channel region coupled to the data line and the conductive region, a charge storage structure, and a first gate. The second transistor includes a second channel region coupled to the data line and the charge storage structure, and a second gate. The first gate is electrically separated from the second gate and opposite from the second gate in a direction from the first channel region to the second channel region.

Memory device having 2-transistor vertical memory cell and separate read and write gates

Some embodiments include apparatuses and methods forming the apparatuses. One of the apparatuses includes a first memory cell including a first transistor including a first channel region and a first charge storage structure, and a second transistor including a second channel region formed over the charge storage structure; a second memory cell adjacent the first memory cell, the second memory cell including a third transistor including a third channel region and a second charge storage structure, and a fourth transistor including a fourth channel region formed over the second charge storage structure; a first access line adjacent a side of the first memory cell; a second access line adjacent a side of the second memory cell; a first dielectric material adjacent the first channel region; a second dielectric material adjacent the third channel region; and a conductive structure between the first and second dielectric materials and adjacent the first and second dielectric materials.

Memory device having 2-transistor vertical memory cell and conductive shield structure

Methods, systems, and devices for structures for word line multiplexing in three-dimensional memory arrays are described. A memory die may include circuitry for access line multiplexing in regions adjacent to or between staircase regions. For example, a multiplexing region may include, for each word line of a stack of word lines, a respective first portion of a semiconductor material and a respective second portion of the semiconductor material, and may also include a gate material operable to modulate a conductivity between the first portions and the second portions. Each word line may be coupled with the respective first portion of the semiconductor material, such that biasing of the gate material may couple the word lines with the respective second portion of the semiconductor material. Such features may support various techniques for multiplexing associated with the stack of word lines, or among multiple stacks of word lines, or both.

Structures for word line multiplexing in three-dimensional memory arrays

Methods, systems, and devices for structures for word line multiplexing in three-dimensional memory arrays are described. A memory die may include circuitry for access line multiplexing in regions adjacent to or between staircase regions. For example, a multiplexing region may include, for each word line of a stack of word lines, a respective first portion of a semiconductor material and a respective second portion of the semiconductor material, and may also include one or more gate material portions operable to modulate a conductivity between respective first and second portions. Each word line may be coupled with the respective first portion of the semiconductor material, such that biasing of the gate material portions may couple the word lines with the respective second portion of the semiconductor material. Such features may support various techniques for multiplexing associated with the stack of word lines, or among multiple stacks of word lines, or both.

Some embodiments include apparatuses in which one of such apparatus includes a first memory cell including a first transistor having a first channel region coupled between a data line and a conductive region, and a first charge storage structure located between the first data line and the conductive region, and a second transistor having a second channel region coupled to and located between the first data line and the first charge storage structure; a second memory cell including a third transistor having a third channel region coupled between a second data line and the conductive region, and a second charge storage structure located between the second data line and the conductive region, and a fourth transistor having a fourth channel region coupled to and located between the second data line and the second charge storage structure; a conductive line forming a gate of each of the first, second, third, and fourth transistors; and a conductive structure located between the first and second charge storage structures and electrically separated from the conductive region.

Memory device having 2-transistor vertical memory cell and shield structures

Some embodiments include apparatuses and methods forming the apparatuses. One of the apparatuses includes a first transistor including a first channel region, and a charge storage structure separated from the first channel region; a second transistor including a second channel region formed over the charge storage structure; and a data line formed over and contacting the first channel region and the second channel region, the data line including a portion adjacent the first channel region and separated from the first channel region by a dielectric material.

Memory device having 2-transistor vertical memory cell and wrapped data line structure

Methods, systems, and devices for efficient power scheme for redundancy are described. A memory device may include circuitry that stores memory address information related to one or more defective or unreliable memory components and that compares memory address information to memory addresses targeted for memory access operations. The memory device may selectively distribute a targeted memory address to one or more circuits within the circuitry based on whether those circuits store memory address information. Additionally or alternatively, the memory device may selectively power one or more circuits within the circuitry based on whether those circuits store memory address information.

Efficient power scheme for redundancy

An inverter includes a transistor, an additional transistor overlying the transistor, and a hybrid gate electrode interposed between and shared by the transistor and the additional transistor. The hybrid gate electrode includes a region overlying a channel structure of the transistor, an additional region overlying the region and underlying an additional channel structure of the additional transistor, and further region interposed between the region and the additional region. The region has a first material composition. The additional region has a second material composition different than the first material composition of the region. Memory devices and electronic systems are also described.

Inverters, and related memory devices and electronic systems

Growing community of inventors

Carmichael, CA, United States of America

Richard Edward Fackenthal