Essilor International (compagnie Generale D'optique)

Essilor International

Richard Bosmans

Pascale Lacan

Karin Scherer

Gerhard Keller

Jean-Paul Cano

Klaus Goedicke

Claudine Biver

Guillaume Giraudet

Volker Kirchhoff

John Biteau

Richard Muisener

Cédric Begon

Sidney Shaw White, Jr

Gilles Massey

Luc Nouvelot

Pascal Comble

J&ouml;m-Steffen Liebig

Wilson Basilio Morales, Jr

Walter Charles Braley

Jean-Fran&ccedil;ois Dufresne

Fatima Frakso

Method for treating antireflection coatings on an optical substrate () involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterized in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer () by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.

Method for treating antireflection coatings on an optical substrate, the thus obtained optical substrate and device for carrying gout said method

A transparent and polarizing vision element () divided into several areas. At least two of said areas are associated with a luminous polarization filter. The light flowing through the element is allocated differently for two the areas according to a direction of polarization of the light. At least one polarization filter is oriented vertically, and at least one polarization filter is oriented horizontally in relation to the usual position of the element.

Transparent and polarizing vision element having areas which are associated with polarization filters that are respectively vertically and horizontally oriented

The invention concerns a method comprising evaporating silicon and/or SiO , wherein said evaporating is further defined as occurring in the presenceof oxygen if silicon or SiO with x less than two is being evaporated, to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.

Method for depositing a fluorine-doped silica film

An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.

Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it

The invention concerns a method for obtaining an ophthalmic lens comprising a surface utility microstructure, in in particular antiglare. The method for obtaining an ophthalmic lens comprising a surface utility microstructure consists in a step for transferring the microstructure into the lens surface from a mould whereof the internal surface bears the microstructure and has a sight correcting geometric design, the microstructure being initially determined by an interferential process. The invention is useful for making ophthalmic lenses.

Method for obtaining an ophthalmic lens comprising a surface utility microstructure and resulting ophthalmic lenses

Method and device for in situ stress measurement within a thin film upon

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Noiseau, France

Richard Bosmans