International Business Machines Corporation

Other

Globalfoundries Inc.

Agency for Science, Technology and Research

Richard Anthony DiPietro

Robert David Allen

Ratnam Sooriyakumaran

Gregory Michael Wallraff

Phillip Joe Brock

Gregory Breyta

Hiroshi Ito

Thomas Ingolf Wallow

James L Hedrick

David Robert Medeiros

Hoa D Truong

Robert Dennis Miller

Kenneth Raymond Carter

Do Yeung Yoon

Larry Funderburk Rhodes

Saikumar Jayaraman

Donald Clifford Hofer

Marie Angelopoulos

Dirk Pfeiffer

Craig Jon Hawker

Richard Vicari

Daniel Joseph Dawson

Carl Eric Larson

Debra Fenzel-Alexander

Jane M Shaw

Pushkara Rao Varanasi

Willi Volksen

Thomas J Fleischman

John Patrick Hummel

Richard Hutzler

George M Benedikt

William King Morse

Keith Brian Maddern

Jere J Brophy

Juliann Opitz

Thomas I Wallow

Christopher E Bannister

Yi Yan Yang

Brian L Goodall

Amanda Catherine Engler

Sally Ann Swanson

Daniel Joseph Coady

Robert A Shick

Victor Y Lee

Martha Inez Sanchez

Shrinivas Venkataraman

Ashlynn Lingzhi Lee

Mitchell Montanez

Hugh Ralph Brown

Hyuk-Jin Cha

A solar panel enclosure converts sunlight to electricity. To remove the large amount of heat from the enclosure a chambered heat exchanger (CHE) is thermally coupled thereto. An air temperature differential is created between chamber air in a CHE portion and chamber air within a CHE heat exchanging portion. When a threshold thermal gradient is reached, air pressure that keeps the chamber air static is overcome creating airflow within the chamber. The airflow draws cooler ambient air from a chamber inlet. Heat from the enclosure is transferred to the cool air and is exhausted from a chamber outlet.

Passive solar panel cooling

A wound dressing and a method of making the wound dressing is described herein. The wound dressing is formed of an absorbent substrate formed of one or more layers and a low-adherence layer disposed on the substrate. The low-adherence layer can be disposed within at least a portion of the substrate. The low-adherence layer is formed of a mixture of at least one highly fluorinated polymer and at least one acidic polymer. The at least one highly fluorinated polymer has a fluorine content greater than the fluorine content of the at least one acidic polymer.

Wound dressing

For a polymer composition, a polymerizable aversive agent is chemically coupled to a substrate element. The chemical coupling is labile to saliva.

Polymer composition with saliva labile aversive agent

Photoresist compositions include a blend of a phenolic polymer with a (meth)acrylate-based copolymer free of ether-containing and/or carboxylic acid-containing moieties. The (meth)acrylate copolymer includes a first monomer selected from the group consisting of an alkyl acrylate, a substituted alkyl acrylate, an alkyl (meth)acrylate, a substituted alkyl methacrylate and mixtures thereof, and a second monomer selected from the group consisting of an acrylate, a (meth)acrylate or a mixture thereof having an acid cleavable ester substituent; and a photoacid generator. Also disclosed are processes for generating a photoresist image on a substrate with the photoresist composition.

Chemically amplified photoresist composition and process for its use

A composite hydrogel comprises an amphiphilic triblock copolymer (ABA) and a loaded micelle bound by noncovalent interactions. The loaded micelle comprises a biologically active substance and an amphiphilic diblock copolymer (CD). The A blocks comprise a steroidal repeat unit (repeat unit 1) having both a backbone carbonate and a side chain bearing a steroid functional group. Each of the A blocks has a degree of polymerization of about 0.5 to about 4.0. The B block comprises a first poly(alkylene oxide) backbone. The C block comprises a second poly(alkylene oxide) backbone. The D block comprises a steroidal repeat unit (repeat unit 2) having both a backbone carbonate group and a side chain comprising a steroid functional group. The composite hydrogel is capable of controlled release of the biologically active substance.

Composite hydrogels for delivery of biologically active materials

Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm/s.

Low outgassing photoresist compositions

Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety &#x2014;OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises a fluorinated alkyl moiety substituted with a protected or unprotected hydroxyl group, and further wherein an atom within R* may be (i) taken together with one of the additional nonhydrogen substituents, if present, or (ii) directly bound to an olefinic carbon atom, to form a ring. The polymers are useful, for example, in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions

The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Negative resists based on acid-catalyzed elimination of polar molecules

Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R, R, R, Rare as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

Negative resists based on a acid-catalyzed elimination of polar molecules

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where Rrepresents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where Rrepresents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where Rrepresents hydrogen (H), methyl (CH), trifluoromethyl (CF), difluoromethyl (CHF), fluoromethyl (CHF), or a semi- or perfluorinated aliphatic chain; and where Rrepresents trifluoromethyl (CF), difluoromethyl (CHF), fluoromethyl (CHF), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.

Photoresist composition

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formulawhere Rrepresents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where Rrepresents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where Rrepresents hydrogen (H), methyl (CH), trifluoromethyl (CF), difluoromethyl(CHF), fluoromethyl (CHF), or a semi- or perfluorinated aliphatic chain; and where Rrepresents trifluoromethyl (CF), difluoromethyl (CHF), fluoromethyl (CHF), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.

Growing community of inventors

San Jose, CA, United States of America

Richard Anthony DiPietro