Lucent Technologies Inc.

Richard Allen Pudliner

Edward Alan Dein

Michael Douglas Gross

Dielectric layers comprising a silicon oxide and having essentially constant thickness across a wafer are produced by a plasma-deposition method; in preferred processing, a wafer is supported on a surface which extends significantly past the edge of the wafer. Resulting layers may be further processed by localized etching of windows or vias, uniform layer thickness being particularly beneficial, when timed etching is used, to ensure uniformity of etched openings.

Growing community of inventors

Whitehall, PA, United States of America

Richard Allen Pudliner