Northrop Grumman Space & Mission Systems Corporation

Rich Lai

Po-Hsin Liu

Jane Lee

Weidong Liu

Wayne Yoshida

Jennifer Wang

Mike Barsky

Linh Dang

Gerry Mei

In a method of forming a semiconductor device on a semiconductor substrate (), a photoresist layer () is deposited on the semiconductor substrate; a window () is formed in the photoresist layer () by electron beam lithography; a conformal layer () is deposited on the photoresist layer () and in the window (); and substantially all of the conformal layer () is selectively removed from the photoresist layer () and a bottom portion of the window to form dielectric sidewalls () in the window ().

High electron mobility transistor semiconductor device and fabrication method thereof

Growing community of inventors

Redondo Beach, CA, United States of America

Rich Lai