Dow Corning Corporation

Ausimont

The Procter Gamble Company

Commissariat a L'energie Atomique Et Aux Energies Alternatives

Università Degli Studi Di Bari

British American Tobacco Limited

Riccardo D'agostino

Gerardo Caporiccio

Pietro Favia

Francesco Cramarossa

Francesco Fracassi

Francesca Illuzzi

Gianfranco Palumbo

Italo Corzani

Steve Martin

Jessica Thery

Antoine Latour

Antonella Milella

Fabio Palumbo

Ritalba Lamendola

Nicoletta De Vietro

The catalyst thin layer consists of electronically conductive catalyst nano-particles embedded in a polymeric matrix. The ratio number of catalyst atoms/total number of atoms in the catalyst layer is comprised between 40% and 90%, more preferably between 50% and 60%.

Catalyst thin layer and method for fabricating the same

Modulated plasma glow discharge treatments for making superhydrophobic substrates

The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'SiO].sub.x, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.

Articles by plasma-activated chemical vapor deposition of fluorinated

The present invention refers to coatings produced by means of the deposit of thin films formed by plasma-activated chemical vapor deposition of volatile fluoridated cyclic siloxanes having the structure [RR'SiO].sub.x, where R is an alkyl group with 1-6 carbon atoms, R' is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. These particular coatings are useful because of their properties of protection and insulation.

Plasma-activated chemical vapor deposition of fluoridated cyclic

Films, layers, tapes, plates, and similar structures of metal or of plastic materials, coated with thin polyfluorocarbon films. These films, tapes, etc., are characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and not porous, and have controlled wettability characteristics. The polyfluorocarbons have the formula (CF.sub.x).sub.n, wherein x is within the range of from 0.3 to 2.0, and are directly obtained on the substrate by the plasma-polymerization of gaseous streams of C.sub.2 F.sub.6 and H.sub.2 ; C.sub.2 F.sub.6 and C.sub.2 F.sub.4 ; CF.sub.4 and H.sub.2 ; CF.sub.4 and C.sub.2 F.sub.4 ; or of C.sub.2 F.sub.4. The metal substrate may be, e.g., Al, Cu, Fe, tin-coated Fe, Si, noble metals and alloys thereof. The substrate of plastic materials may be constituted, e.g., by polytetrafluoroethylene, polypropylene, polyethylene, polyphenyloxide, polycarbonate, and neoprene.

Method of coating with polyfluorocarbons

Films, layers, tapes, plates, and similar structures of metal or of

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Bari, Italy

Riccardo D'agostino