Asml Netherlands B.v.

Reza Sahraeian

Dimitra Gkorou

Alexander Ypma

Vahid Bastani

Dag Sonntag

Juan Manuel Gonzalez Huesca

Carlo Lancia

Eleftherios Koulierakis

A method of determining a contribution of a process feature to the performance of a process of patterning substrates. The method may include obtaining a first model trained on first process data and first performance data. One or more substrates may be identified based on a quality of prediction of the first model when applied to process data associated with the one or more substrates. A second model may be trained on second process data and second performance data associated with the identified one or more substrates. The second model may be used to determine the contribution of a process feature of the second process data to the second performance data associated with the one or more substrates.

Method and apparatus for determining feature contribution to performance

A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.

Method for determining an inspection strategy for a group of substrates in a semiconductor manufacturing process

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Eindhoven, Netherlands

Reza Sahraeian