Asml Netherlands B.v.

Reza Mahmoodi Baram

Everhardus Cornelis Mos

Hubertus Johannes Gertrudus Simons

Yichen Zhang

Hadi Yagubizade

Xiuhong Wei

A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.

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Veldhoven, Netherlands

Reza Mahmoodi Baram