Ciba Specialty Chemicals Corporation

Cytec Technology Corporation

International Business Machines Corporation

Ciba Speciatly Chemicals Corporation

Revathi Iyengar

Ramanathan Ravichandran

Mervin Gale Wood

Joseph Suhadolnik

Ram Baboo Gupta

Jean-Pierre Wolf

Robert E Detlefsen

Lawrence A Flood

David A Ley

Anthony DeBellis

Walter L Renz

Vankatarao K Pai

Stephen L Buchwalter

Alfred Viehbeck

Terrence Robert O'Toole

Martin J Goldberg

Tyler A Stevenson

Peter Alfred Gruber

Fuad Elias Doany

Pascal Hayoz

Claudius Feger

David Hirsch Danovitch

Nancy C LaBianca

Luther A R Hall

Anthony David Debellis

Venkatarao K Pai

Joseph Suhadonlik

Methods for fabricating microelectronic interconnection structures as well as the structures formed by the methods are disclosed which improve the manufacturing throughput for assembling flip chip semiconductor devices. The use of a bilayer of polymeric materials applied on the wafer prior to dicing eliminates the need for dispensing and curing underfill for each semiconductor at the package level, thereby improving manufacturing throughput and reducing cost.

Bilayer wafer-level underfill

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as &agr;-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.

Benzotriazole UV absorbers having enhanced durability

Provided is a process for preparing an at least bis-carbamate functional 1,3,5-triazine by contacting an at least diamino-1,3,5-triazine, an acyclic organic carbonate and a base, as well as certain novel compositions producible thereby. Also provided are substantially halogen contamination free crosslinker compositions comprising the products obtainable by the process, and curable compositions based upon these crosslinkers.

Process for the preparation of 1,3,5-triazine carbamates from amino-1,3,5-triazines and organic carbonates

1,3,5-Triazine carbamates from amino-1,3,5-triazines and organic carbonates and curable compositions thereof

Adhesive compositions are rendered stable against degradation caused by ultraviolet light through the incorporation of a highly soluble, photostable benzotriazole UV absorber which is substituted in the ortho position of the hydroxyphenyl ring by &agr;-cumyl or phenyl. Examples of such compounds are 2-(2-hydroxy-3-&agr;-cumyl-5-tert-octylphenyl)-2H-benzotriazole, 5-chloro-2-(2-hydroxy-3-&agr;-cumyl-5-tert-octylphenyl)-2H-benzotriazole, 5-fluoro-2-(2-hydroxy-3-&agr;-cumyl-5-tert-octylphenyl)-2H-benzotriazole, 2-(2-hydroxy-3-&agr;-cumyl-5-tert-butylphenyl)-2H-benzotriazole, 5-chloro-2-(2-hydroxy-3-&agr;-cumyl-5-tert-butylphenyl)-2H-benzotriazole and 5-fluoro-2-(2-hydroxy-3-&agr;-cumyl-5-tert-butylphenyl)-2H-benzotriazole. These compounds exhibit excellent photostability and are highly soluble in adhesive formulations. The laminated articles derived from these compositions include, for example, solar control films, films and glazings, UV absorbing glasses and glass coatings, windscreens, retroreflective sheetings and signs, solar reflectors, optical films and the like.

Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom

Adhesive compositions are rendered stable against degradation caused by ultraviolet light through the incorporation of a highly soluble, high extinction, photostable hydroxyphenyl-s-triazine UV absorber or mixtures of s-triazine UV absorbers. An example of such compounds is 2,4-bis(2,4-dimethylphenyl)-6-&lsqb;2-hydroxy-4-(3-nonyloxy*-2-hydroxypropyloxy)-5-&agr;-cumylphenyl&rsqb;-s-triazine (* denotes a mixture of octyloxy, nonyloxy and decyloxy groups). Such compounds exhibit high extinction, excellent photostability and are highly soluble in adhesive formulations. The laminated articles derived from these compositions include, for example, solar control films, films and glazings, UV absorbing glasses and glass coatings, windscreens, retroreflective sheetings and signs, solar reflectors, optical films and the like.

Stabilized adhesive compositions containing highly soluble, high extinction, photostable hydroxyphenyl-s-trianzine UV absorbers and laminated articles derived therefrom

Adhesive compositions are rendered stable against degradation caused by ultraviolet light through the incorporation of a highly soluble, high extinction, photostable hydroxyphenyl-s-triazine UV absorber. An example of such compounds is 2,4-bis(2,4-dimethylphenyl)-6-&lsqb;2-hydroxy-4-(3-nonyloxy*-2-hydroxypropyloxy)-5-&agr;-cumylphenyl&rsqb;-s-triazine (* denotes a mixture of octyloxy, nonyloxy and decyloxy groups). Such compounds exhibit high extinction, excellent photostability and are highly soluble in adhesive formulations. The laminated articles derived from these compositions include, for example, solar control films, films and glazings, UV absorbing glasses and glass coatings, windscreens, retroreflective sheetings and signs, solar reflectors, optical films and the like.

Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom

Adhesive compositions are rendered stable against degradation caused by ultraviolet light through the incorporation of selected highly soluble, red-shifted, photostable benzotriazole UV absorbers which absorb light strongly in the 350 to 400 nm range. These UV absorbers exhibit excellent photostability and are highly soluble in adhesive formulations. The laminated articles derived from these compositions include, for example, solar control films, films and glazings, UV absorbing glasses and glass coatings, windscreens, retroreflective sheetings and signs, solar reflectors, optical films and the like.

Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as .alpha.-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.

Provided is a novel carbamate functional 1,3,5-triazine of the general formula ##STR1## wherein Z' is selected from the group consisting of hydrogen, hydrocarbyl, and a group represented by the formula NHQ',

Carbamate functional 1,3,5-triazines

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings.

Selected s-triazines of formula I ##STR1## where G.sub.1 and G.sub.2 are biphenylyl moieties, are UV absorbers having high thermal stability and surprisingly high extinction coefficients making them of especial interest in stabilizing automotive coatings where such properties are highly valued.

Growing community of inventors

Courtland Manor, NY, United States of America

Revathi Iyengar