Tec-sem Ag

Steinemann Technology Ag

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Jakob Blattner

An apparatus and a method for handling individual wafers ( ) that are temporarily in an essentially horizontal position. The apparatus ( ) comprises at least one supporting part ( ) with supporting areas ( ), comprising at least three supporting points ( ), for supporting an edge region of the wafer, and at least one holding part ( ) with holding areas ( ), comprising at least two holding points ( ), for gripping the edge ( ) of this wafer ( ), with the holding points ( ) being moveable relative to the supporting points ( ) and, to grasp the wafer ( ), relative to one another. Moreover, at least one of these holding points ( ) is arranged on a rotatable rod ( ) designed, for reliable holding of the wafer, as a holding part ( ), with rod ( ) extending coaxially with an axis ( ) running through the wafer center ( ) and essentially parallel to the surface of the wafer ( ).

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Altnau, Switzerland

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