Screen Holdings Co., Ltd.

Reo Tamura

Tomomi Iwata

Takayoshi Tanaka

Tetsuya Emoto

Atsuro Eitoku

Yuya Tsuchihashi

Takashi Akiyama

Yuta Nakano

Akira Oato

Teppei Nakano

A substrate processing method includes a rinse liquid supplying step of supplying a rinse liquid containing water to a major surface of a substrate, a rotating step of rotating the substrate around a rotation axis passing through a central portion of the major surface of the substrate, and a hydrophobizing agent supplying step of supplying a hydrophobizing agent containing a first dissolving agent to the major surface of the substrate to replace a liquid held on the major surface of the substrate with the hydrophobizing agent in parallel with the rotating step after the rinse liquid supplying step is performed, and the hydrophobizing agent supplying step includes a hydrophobizing agent discharging step of discharging a continuous flow of the hydrophobizing agent from a discharge port of a nozzle toward the major surface of the substrate held by a substrate holding unit with a Reynolds number at the discharge port being not more than 1500.

Substrate processing method and substrate processing apparatus

Growing community of inventors

Kyoto, Japan

Reo Tamura