Asml Netherlands B.v.

René Wilhelmus Antonius Hubertus Leenaars

Erik Roelof Loopstra

Hans Butler

Joost Jeroen Ottens

Andre Bernardus Jeunink

Martijn Houben

Wilhelmus Franciscus Johannes Simons

Marcus Martinus Petrus Adrianus Vermeulen

Maurice Willem Jozef Etiënne Wijckmans

Rene Theodorus Petrus Compen

Peter Smits

Martinus Van Duijnhoven

Hendrikus Johannes Marinus Van Abeelen

Hendrikus Herman Marie Cox

Dave Braaksma

Stephan Christiaan Quintus Libourel

Antonius Arnoldus Meulendijks

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

Lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

René Wilhelmus Antonius Hubertus Leenaars