Sagem Defense Securite

Shanghai Micro Electronics Equipment Co., Ltd.

Safran Electronics & Defense

Renaud Mercier Ythier

Bertrand Plainchamp

The invention relates to a photolithographic illuminator device including: a light beam source, a condenser (), an optical homogenizing system () including at least one microlens array, said system being arranged upstream from the condenser, and a shutter () arranged at the object focal point of the optical homogenizing system, the illuminator being characterized in that same further comprises a network of aperture diaphragms () arranged in the Fourier transform plane of the shutter plane (). The invention likewise relates to a photolithographic device including such an illuminator.

Photolithographic illuminator device enabling controlled diffraction

The invention relates to a photolithographic illumination device including: a light beam source; a condenser (); an optical homogenizing system (), including at least one microlens array (L, L), arranged upstream from the condenser () such that the image focal plane of the optical homogenizing system is positioned in the object focal plane of the condenser; a shutter (), arranged in the object focal plane of the optical homogenizing system, and in which the optical homogenizing system includes two microlens arrays (L, L), the spacing as well as the arrangement and orientation of the microlenses of which are designed such that, in two directions (X, Y) orthogonal to the optical axis, the optical homogenizing system has merged image focal planes and merged object focal planes. The invention likewise relates to a photolithographic device including such an illuminator.

Growing community of inventors

Boulogne-Billancourt, France

Renaud Mercier Ythier