Asml Netherlands B.v.

Renatus Gerardus Klaver

Engelbertus Antonius Fransiscus Van Der Pasch

Erik Roelof Loopstra

Emiel Jozef Melanie Eussen

Martijn Robert Hamers

Hans Butler

Marc Wilhelmus Maria Van Der Wijst

Marinus Aart Van Den Brink

Robbert Edgar Van Leeuwen

Peter Hoekstra

Boudewijn Theodorus Verhaar

Georgo Angelis

An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.

Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system

A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.

Displacement measurement system having a prism, for displacement measurement between two or more gratings

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.

Lithographic apparatus and calibration method

Displacement measurement systems lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Renatus Gerardus Klaver