Iscar, Ltd.

Ihi Ionbond Ag.

Ionbond Ag

Ihi Bernex Ag

Renato Bonetti

Hristo Strakov

Albir A Layyous

Michael Auger

Yehezkeal Landau

The invention relates to a CVD-reactor for depositing layers made of a reaction gas onto workpieces. Said reactor comprises an elongate, vertical reaction chamber that is defined by a reactor wall and a reactor base, an inlet line for guiding the reaction gas into the reaction chamber, entering into the region of the reactor base in the reaction chamber, a central outlet line that guides the used reaction gas out of the reaction chamber and that extends out of the reactor chamber in the region of the reactor base, a tier-like workpiece receiving element that is arranged in a central manner in the reaction chamber and can be rotated about the central axis thereof.

Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces

A coated metal substrate has at least one layer of titanium based hard material alloyed with at least one alloying element selected from the list of chromium, vanadium and silicon. The total quantity of alloying elements is between 1% and 50% of the metal content, the layer having a general formula of: (TiCrVSi)CNO.

Coated cutting tool, cutting member or wear part

Growing community of inventors

Winznau, Switzerland

Renato Bonetti