Sumitomo Electric Industries, Limited

Ren Kimura

Toru Hiyoshi

Hirotaka Oomori

So Tanaka

Ryosuke Kubota

Tatsushi Kaneda

Kazuhito Kobashi

A method of manufacturing a photodetection device includes preparing a first substrate having a first electrode; forming, on the first substrate, a photoresist film having an opening through which the first electrode is exposed; forming, through the opening, a metallic film containing a first metal on the first electrode; and removing, after the forming of the metallic film, the photoresist film. The forming of the metallic film includes vapor-depositing the metallic film on the first electrode and on the photoresist film, and heating the metallic film formed on the photoresist film.

Method of manufacturing photodetection device

A semiconductor apparatus includes a heatsink plate, a substrate disposed on the heatsink plate, a circuit pattern disposed on the substrate, a semiconductor chip disposed on the circuit pattern, a case fixed to the heatsink plate and surrounding an outer perimeter of the substrate, a terminal attached to the case, and a wire configured to electrically connect the terminal to the circuit pattern or to the semiconductor chip. In a plan view as viewed in the thickness direction of the heatsink plate, a portion of the circuit pattern overlaps the terminal.

Semiconductor apparatus

A semiconductor includes: a substrate; a circuit pattern on the substrate, and including a first region, a second region located away from the first region, and a third region between the first region and the second region; a first chip disposed in the second region and including a diode; a second chip disposed in the third region, the second chip including a vertical transistor having a source pad disposed on a surface opposite to a surface facing the third region in a thickness direction of the substrate, and a gate pad disposed at a position different from the source pad; a first wire including a first bonded portion bonded to the first region, a second bonded portion bonded to the second chip, and a third bonded portion bonded to the first chip; and a second wire arranged to be adjacent to the first wire with the gate pad sandwiched therebetween.

Semiconductor device

A method for manufacturing a semiconductor device includes a step of preparing a SiC substrate, a step of fixing the SiC substrate on an electrostatic chuck and heat-treating the SiC substrate, and a step of performing ion implantation treatment on the SiC substrate fixed on the electrostatic chuck and heat-treated. The step of heat-treating includes an outer circumferential-side chucking step which generates an electrostatic attraction force between an outer circumferential region of the SiC substrate and an outer circumferential portion of the electrostatic chuck, the outer circumferential portion facing the outer circumferential region, and an inner circumferential-side chucking step which is started after the outer circumferential-side chucking step is started, and generates an electrostatic attraction force between an inner circumferential region of the SiC substrate and an inner circumferential portion of the electrostatic chuck, the inner circumferential portion facing the inner circumferential region.

Growing community of inventors

Osaka, Japan

Ren Kimura