Arcelormittal

Remy Bonnemann

Eric Silberberg

Sergio Pace

Bruno Schmitz

Didier Marneffe

Lucie Gaouyat

Dimitri Wilders

A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including:

Vacuum deposition facility and method for coating a substrate

A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal and a vacuum deposition facility for the method for continuously depositing on a running substrate.

A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:

A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thickness, wherein the coating is deposited homogenously such that the maximum thickness of the coating can exceed the average thickness of 15% maximum. A vacuum deposition facility also is provided.

Growing community of inventors

Saint-Nicolas, Belgium

Remy Bonnemann