Alcatel Lucent

Alcatel

Remi Thollot

Arnaud Favre

Jean-Pierre Desbiolles

Erwan Godot

Xavier Metais

Amaud Favre

Francoise Desbiolles, Legal Representative

The aim of the invention is to provide a method for the treatment of a transport support () for the conveyance and storage of semiconductor substrates, with said support () possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support () is placed in a sealed chamber () connected to a vacuum pump () and said transport support () is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (). The invention also concerns a treatment station for a transport support () for implementation of the method.

Method for treating a transport support for the conveyance and atmospheric storage of semiconductor substrates, and treatment station for the implementation of such a method

A device is used to measure contamination directly in transport enclosures of FOUP or SMIF type, for example. The transport enclosure is placed on an adapter that sets up direct communication between it and an external gas analyzer. The gas analyzer ionizes the sampled gases and performs the analysis by measuring a parameter of the ions resulting from this ionization. This measures very low levels of gaseous contamination in real time.

Method and device for monitoring the contamination of substrate wafers

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Saint Christo en Jarez, France

Remi Thollot