Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Philips Lighting Holding B.v.

Remco Yuri Van De Moesdijk

Marcus Joannes Van Den Bosch

Han-Kwang Nienhuys

Frank Johannes Jacobus Van Boxtel

Berend Jan Willem Ter Weeme

Borgert Kruizinga

Xiaoqing Duan

Yan Xiong

Hermen Folken Pen

Dries Vaast Paul Hemschoote

Güneş Nakiboglu

Güneş Nakiboğlu

Rita Marguerite Albin Lambertine Petit

An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.

Apparatus incorporating a gas lock

A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

Measurement system, lithographic apparatus and device manufacturing method

There is provided a lighting devicecomprising a light source, a driver arranged for powering the light source, which is separated in space from the light source. The lighting device has two separate heat sinks, a light source heat sinkto which the light source is thermally coupled, and a driver heat sinkto which the driver is thermally coupled. The light source heat sink and the driver heat sink are separated by an air gapto provide thermal decoupling of the light source heat sink and the driver heat sink.

Lighting device

This invention relates to a lighting device having a light source (), a light output unit, a drive unit () arranged to drive the light source, an electrical connection unit connected with the drive unit and arranged to receive input power, and a heat sink (), which has been provided with multiple reception portions (). At least the light source and the drive unit are mounted at a first respectively a second reception portion of the heat sink. The heat sink is a formed sheet structure, which has been formed into a predetermined shape from a sheet shaped heat sink blank.

Multi-functional heat sink for lighting products

Growing community of inventors

Geldrop, Netherlands

Remco Yuri Van De Moesdijk