Asml Netherlands B.v.

Remco Van De Meerendonk

Nicholas Peter Waterson

Johannes Henricus Wilhelmus Jacobs

Franciscus Johannes Joseph Janssen

Antonius Johannus Van Der Net

Daniel Jozef Maria Direcks

Roger Wilhelmus Antonius Henricus Schmitz

Gerardus Arnoldus Hendricus Franciscus Janssen

Sven Pekelder

Joost André Klugkist

Jaap Oudes

Güneş Nak{dot Over (i)}boğlu

Johannes Franciscus Martinus Van Santvoort

Güneş Nakiboğlu

Philippe Jacqueline Johannes Hubertus Anthonius Habets

Steve Gregory Brust

Shravan Kottapalli

Jeroen Peterus Johannes Van Lipzig

Joris Dominicus Bastiaan Johannes Van Den Boom

Güneş Nakiboǧlu

Dirk Martinus Gerardus Petrus Wilhelmus Jakobs

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object

A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.

Temperature conditioning system

An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device () arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element () having a first fluid channel () arranged therein, the first shield element having a first surface () and a second surface (), the first surface being arranged closer to the radiative element than the second surface; and a second shield element () having a second fluid channel () arranged therein, the second shield element having a third surface () and a fourth surface (), the third surface being arranged closer to the radiative element than the fourth surface. The first shield element is arranged closer to the radiative element than the second shield element and the second shield element is arranged closer to the heat-sensitive device than the first shield element, the first shield element and the second shield element spaced apart from each other and the second surface and the third surface opposing each other.

Radiation shielding device and apparatus comprising such shielding device

Growing community of inventors

's-Hertogenbosch, Netherlands

Remco Van De Meerendonk