Koninklijke Philips Corporation N.V.

Remco Van Brakel

Marcus Antonius Verschuuren

Marcus Antonius Verschuuren, Jr

Manuela Lunz

Gabriel Sebastian Lozano Barbero

Ke Guo

Hubertas Wilhelmus Jacobus Jozef Van De Laar

Hubertus Wilhelmus Jacobus Jozef Van De Laar

Handle for nanoimprinting machine

A method of manufacturing a patterned stamp for patterning a contoured surface is disclosed. The method comprises providing a pliable stamp layer carrying a pattern of features, forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer over the pliable stamp layer on the contoured surface; solidifying the support layer to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

Patterned stamp manufacturing method, patterned stamp imprinting method and imprinted article

A method of manufacturing a patterned stamp () for patterning a contoured surface () is disclosed. The method comprises applying a layer () of a pliable material precursor over a master () carrying an inverse pattern () to form a desired pattern () in said layer; curing the pliable material precursor to form a pliable stamp layer () comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer () to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

Patterned stamp manufacturing method, patterned stamp and imprinting method

Disclosed is a silane-based composition for forming an imprinting ink for imprint lithography applications in which the crosslinking of the silanes in the composition is suppressed by the inclusion of a compound of Formula 3: wherein Ris selected from the group consisting of C-Clinear or branched alkyl groups and a phenyl group, and wherein n is a positive integer having a value of at least 2. An ink may be formed by adding a PAG, photoinitiator or TAG to the composition such upon their activation, the crosslinking reaction is completed. An imprinting method using 10 such an ink is also disclosed. 

Composition, imprinting ink and imprinting method

Disclosed is a method and apparatus for contacting a relief stamping surface of a flexible stamp with a receiving surface of a substrate. The method and apparatus can be used in an imprinting method. During the method and with the apparatus, creation or breaking of contact near a contact front (border) of a preformed contact area in which a part of a locally bent relief stamping surface is in contact with the stamp receiving surface, the speed of such creation or breaking is varied for different parts of the flexible stamp such that this contact front moves over the stamp receiving surface with different speed at different locations along a contact front movement trajectory on the stamp receiving surface. This may be used to optimize throughput when using such method and apparatus.

Imprinting method, computer program product and apparatus for the same

There is provided an illumination device comprising: a wavelength converting layer comprising a photon emitting donor configured to absorb energy to reach an excited state, and a photon emitting acceptor; an energy source configured to provide energy to the donor such that the donor reach the excited state; wherein the donor and the acceptor are selected and arranged at a distance from each other such that non-radiative transfer of excitation energy from the donor to the acceptor occur, and wherein the acceptor is configured to emit a photon at a second wavelength after the transfer of energy; the illumination device further comprising a periodic plasmonic antenna array, arranged on the substrate and embedded within the wavelength converting layer, and comprising a plurality of individual antenna elements arranged in an antenna array plane, the plasmonic antenna array being configured to support a first lattice resonance at the second wavelength, arising from coupling of localized surface plasmon resonances in the individual antenna elements to photonic modes supported by the system comprising the plasmonic antenna array and the wavelength converting layer, wherein the plasmonic antenna array is configured to comprise plasmon resonance modes such that light emitted from the plasmonic antenna array has an anisotropic angle distribution.

Solid state illumination device based on non-radiative energy transfer

A method of manufacturing a patterned stamp () for patterning a contoured surface () is disclosed. The method comprises providing a pliable stamp layer () carrying a pattern of features (), forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer () over the pliable stamp layer on the contoured surface; solidifying the support layer () to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

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Breda, Netherlands

Remco Van Brakel