Daimler-benz Ag

Daimler Chrysler Ag

Siliconix Incorporated

Damilerchrysler Ag

Reinhard Zachai

Tim Gutheit

Hans-Juergen Fuesser

Wolfram Muench

Hans-Jurgen Fusser

Fwu-Iuan Hshieh

Yueh-Se Ho

Mike F Chang

Martin Hartweg

King Owyang

Martin Matt

Jowei Dun

Claus-Peter Klages

Karl-Heinz Thiemann

Herbert Guettler

Herbert Klein

Erhard Kohn

Mona Ferguson

Ulrich Buettner

Hans-J&uuml;rgen F&uuml;sser

Karl-Heinrich Greeb

Marin Hartweg

Xin Jiang

Manfred R&ouml;sler

Guntmar Schulz

Andre Floeter

Peter Bodo Gluche

Paul Ziemann

Kenneth Goodson

Reiner Schaub

Eckart Bottger

An exhaust line for an exhaust system of an internal combustion engine having a catalytic converter, the exhaust line being located upstream of the catalytic converter with respect to the flow direction of exhaust. The exhaust line has an externally applied heat-conducting layer preferably made of a metallic material and an internally disposed insulating layer made of a heat-insulating material. The insulating layer and the heat-conducting layer are connected directly and forcewise with one another. The layer thickness of the insulating layer is less than 2 mm, the specific heat capacity c of the insulating layer is less than 10,J/(m,h), and the heat diffusivity &kgr; of the insulating layer is less than 0.01 cm,/s.

Exhaust line of an exhaust system equipped with a catalytic converter for an internal combustion engine

Process for producing heteropitaxial diamond layers on Si-substrates

A microcooling device and a method for its manufacture. The microcooling device has a high heat conductivity, is designed to accommodate electronic components on its exterior surface, and has a channel structure in its interior through which a coolant fluid can flow to carry heat away from the components. The channel structure is formed by a base substrate provided with a plurality of recesses and a cover layer externally covering the recesses, the cover layer being made from an electrically insulating and heat-conducting material, and being such that the electronic components can be mounted directly thereon.

Microcooling device and method of making it

The invention relates to a composite structure for an electronic component with an undoped diamond layer, at least one side of which is covered by a doped non-diamond layer, arranged on a growth substrate. The diamond layer has a thickness of less than 0.5 .mu.m. In addition, the conduction and/or valence bands of the diamond layer and the nondiamond layer exhibit such a band discontinuity that charge carries from the doped non-diamond layer which are excited optically and/or thermally, for example, can be drawn, with a reduction of their potential energy, into the valence and/or conduction band of the undoped diamond layer. This configuration causes a potential well to exist in the area of the diamond layer, at least in one direction, with a quantizing effect for the charge carriers drawn into the diamond layer.

Composite structure of an electronic component

A growth substrate having growth nuclei made of diamond and/or diamond-like carbon arranged on its growth surface, the orientation of over 50% of the growth nuclei deviating by less than 10.degree. from the crystal orientation defined by the growth substrate corresponding to Miller's indices (h, k, l) and the nucleus density changes between the center of the growth substrate and a distance of maximally 15 mm from the center by maximally 80%. The method also relates to a process for the growth substrate's manufacture.

Growth substrate having growth nuclei made of diamonds and/or

A composite structure for electronic components, having a base substrate with a flat side provided with a depression, and having a cover layer which is disposed on the flat side structured by the depression, and the depression being covered to form a hollow structure. The depression in the base substrate is created prior to the deposition of the cover layer and has a clear width measured parallel to the flat side that is less than one-half of its clear depth measured before the cover layer is applied. The vapor phase deposited cover layer is formed from a material which has a sufficiently high surface tension to promote three-dimensional growth of the vapor phase deposited layer.

Composite structure and method for the production thereof

The invention provides a composite structure for microelectronic components having a self-supporting metal plate, an electrically insulating layer adhering to the metal plate, and a functional layer adhering to the insulating layer for the application of at least one microelectronic component. An at least largely monocrystalline information layer which covers the metal plate at points is applied to the self-supporting metal plate. The regions of the surface of the metal plate which are free of the information layer are provided with the insulating layer. When the surface of the information layer is exposed at least in regions, the functional layer is deposited on the insulating layer and on the exposed information layer. The crystal information required for an epitaxial deposition of the functional layer is taken from the information layer.

Composite structure for manufacturing a microelectronic component and a

The invention relates to a composite structure including a semiconductor layer arranged on a diamond layer and/or a diamond-like layer, for subsequent processing to produce electronic components and/or groups of components and to a process for producing such a composite structure. In order to improve the quality of the subsequent components, the diamond layer is deposited underneath the component source zones from which the components are subsequently produced, and the diamond or diamond-like layer is provided at the margins of the component source zones and/or outside of the component source zones with edges where the thickness of the layer changes abruptly such that the edges have an edge height amounting to at least 1O%, preferably at least 50%, of the layer thickness of the diamond layer. Imperfections such as dislocations or other discontinuities in the semiconductor layer tend to collect at these edges outside of the component source zones, thereby decreasing the density of discontinuities in the component source zones and improving the quality of electronic components produced of material from the component source zones.

Composite structure comprising a semiconductor layer arranged on a

An integrated circuit chip has full trench dielectric isolation of each portion of the chip. Initially the chip substrate is of conventional thickness and has semiconductor devices formed in it. After etching trenches in the substrate and filling them with dielectric material, a heat sink cap is attached to the passivation layer on the substrate front side surface. The passivation layer is a CVD diamond film which provides both electrical insulation and thermal conductivity. The substrate backside surface is removed (by grinding and/or CMP) to expose the bottom portion of the trenches. This fully isolates each portion of the die and eliminates mechanical stresses at the trench bottoms. Thereafter drain or collector electrical contacts are provided on the substrate backside surface. In a flip chip version, frontside electrical contacts extend through the frontside passivation layer to the heat sink cap. In a surface mount version, vias are etched through the substrate, with surface mount posts formed on the vias, to contact the frontside electrical contacts and provide all electrical contacts on the substrate backside surface. The wafer is then scribed into die in both versions without need for further packaging.

Surface mount and flip chip technology with diamond film passivation for

The invention relates to a composite structure for electronic components comprising a growth substrate, an intermediate layer having substantially a crystallographic lattice structure arranged on the growth substrate, and a diamond layer applied on top of the intermediate layer, and to a process for producing a composite structure of this type. In order to obtain a diamond layer of highest quality, the intermediate layer has substantially a zinc blende or diamond or a calcium fluoride structure, in which at the outset of the intermediate layer the difference between the lattice constant of the intermediate layer and the lattice constant of the growth substrate, relative to the lattice constant of the growth substrate, is less than 20%, in particular less than 10%, and in which at the transition from the intermediate layer to the diamond layer for the lattice constant of the intermediate layer and the lattice constant of the diamond layer the value of the expression .vertline.(n*a.sub.ZS -m*a.sub.D).vertline./n*a.sub.ZS is less than 0.2, in particular less than 0.1, wherein n and m are natural numbers, a.sub.D is the lattice constant of the diamond layer, and a.sub.ZS is the lattice constant of the intermediate layer at the transition to the diamond layer.

Composite structure for an electronic component comprising a growth

An arrangement of a plurality of microcooling devices provided with electrical components, each microcooling device having a closed channel structure for a coolant to flow through, and being provided with electrical conductors for the electronic components and with externally carried fluid ducts for a coolant which flows through the channel structures. A covering layer which forms one of at least two flat sides of the microcooling device is made from an electrically insulating material with good heat conductivity. The electronic components are arrayed on this cover layer and on the opposite flat side of each microcooling device. Adjacent microcooling devices which are provided with electronic components on confronting flat sides are arranged with their components spaced apart or staggered with respect to one another, and the components of one microcooling device preferably are in contact with the cover layer of the adjacent microcooling device.

Arrangement of plural micro-cooling devices with electronic components

The invention relates to a semiconductor composite structure for an electronic component. The semiconductor composite structure comprises a diamond layer, which is substantially undoped except for unavoidable impurities, one side of which is covered by a doped diamond-free semiconductor layer, with the layers being arranged on a growth substrate. The discontinuity which exists at the transition between the semiconductor layer and the diamond layer with respect to the conduction band and/or the valence band, is such that in the semiconductor layer charge carriers, which are excited optically and/or thermally, can be conducted in the valence band and/or conduction band of the undoped diamond layer with a decrease in their potential energy.

Electronic component with a semiconductor composite structure

The invention relates to a composite structure for electronic components comprising a growth substrate, an intermediate layer having substantially a crystallographic lattice structure arranged on the growth substrate, and a diamond layer applied on top of the intermediate layer, and to a process for producing a composite structure of this type. In order to obtain a diamond layer of highest quality, the intermediate layer has substantially a zinc blende or diamond or a calcium fluoride structure, in which at the outset of the intermediate layer the difference between the lattice constant of the intermediate layer and the lattice constant of the growth substrate, relative to the lattice constant of the growth substrate, is less than 20%, in particular less than 10%, and in which at the transition from the intermediate layer to the diamond layer for the lattice constant of the intermediate layer and the lattice constant of the diamond layer the value of the expression

Process of producing diamond composite structure for electronic

Growing community of inventors

Guenzburg, Germany

Reinhard Zachai