Carl Zeiss Smt Gmbh

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Reinhard Voelkel

Kenneth Weible

Markus Deguenther

Johannes Wangler

Manfred Maul

Michael Layh

Axel Scholz

Ralf Scharnweber

Heiko Siekmann

Uwe Spengler

Jacques Duparre

Andreas Braeuer

Frank Wippermann

Philipp Helmut Schmaelzle

Michael Gerhard

Andreas Brueckner

Peter Dannberg

Daniel Runde

Gundula Weiss

Martin Punke

Robert Leitel

Florian Doll

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Illumination system for a microlithographic projection exposure apparatus

A device for optically imaging at least part of an object onto an area of a digital image sensor includes an optical channel, which includes a first imaging lens arranged on a first substrate, a second imaging lens arranged on a second substrate, and a field lens arranged on a third substrate. The first and second imaging lenses are identical and arranged such that a first surface of the first imaging lens is a light entry surface of the optical channel and that a first surface of the second imaging lens is a light exit surface of the optical channel. The field lens is arranged between the first imaging lens and the second imaging lens such that an axis running perpendicularly to the lateral extension of the optical channel and through a lateral center of the field lens forms a symmetry axis of the optical channel.

Device for optical imaging

An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.

Optical beam deflecting element, illumination system including same, and related method

The invention relates to a microlens array with integrated illumination, an imaging system with such a microlens array, an image detection device and also a method for producing the microlens array.

Array of microlenses with integrated illumination

Growing community of inventors

Neuchatel, Switzerland

Reinhard Voelkel