Robert Boschgmbh

Reinhard Neul

Markus Lutz

Franz Laermer

Johannes Classen

Christoph Schelling

Bernd Schumann

Burkhard Kuhlmann

Udo-Martin Gomez

Joerg Hauer

Daniel Christoph Meisel

Torsten Ohms

Wolfram Bauer

Rainer Willig

Karsten Funk

Jochen Franz

Christian Doering

Odd-Axel Pruetz

Axel Franke

Mirko Hattass

Oliver Kohn

Christoph Lang

Friedjof Heuck

Rolf Scheben

Jens Frey

Robert Maul

Benjamin Schmidt

Ando Feyh

Frank Schatz

Thomas Fuehrer

Siegbert Steinlechner

Silvia Kronmueller

Lars Tebje

Roland Mueller-Fiedler

Heiko Stahl

Alexander Buhmann

Frederik Ante

Nils Felix Kuhlmann

Peter Degenfeld-Schonburg

Niels Bode

Udo Bischof

Matthias Kuehnel

Andreas Lassl

Kersten Kehr

Jan-Timo Liewald

Andreas Thomae

Michael Fehrenbach

Gerhard Wucher

Siegbert Goetz

Christian Hoeppner

Dieter Maurer

Dietmar Krieg

Andreas Lassi

Michael Knauss

Georg Bischopink

Johannes Artzner

Achim Trautmann

Dirk Lamprecht

Eberhard Schmid

Michael Veith

Christian Rettig

Udo Gomez

Gunar Lorenz

Johannes Artznei

Jullian Gonska

Marco Quander

Manuel Engesser

Dorothea Papathanassiou

Burhard Kuhlmann

Marko Rocznik

A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Micromechanical rate-of-rotation sensor set-up, rate-of-rotation sensor array and corresponding manufacturing method

A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.

Rotation-rate sensor, method for producing a rotation-rate sensor

A yaw-rate sensor with a substrate having a main extension plane. The yaw-rate sensor includes a rotation-element assembly, the rotation-element assembly being designed for detecting yaw rates prevailing in a first main extension axis of the substrate and yaw rates prevailing in a second main extension axis of the substrate perpendicular to the first main extension axis. The yaw-rate sensor has a sensor assembly, the sensor assembly being designed for detecting a yaw rate prevailing perpendicular to the main extension plane of the substrate, both the sensor assembly and the rotation-element assembly being drivable with the aid of a drive assembly, the drive assembly being designed for driving movement along the first main extension axis.

Yaw-rate sensor with a substrate having a main extension plane, method for manufacturing a yaw-rate sensor

A MEMS device and a corresponding operating method. The MEMS device is equipped with an oscillatory micromechanical system, which is excitable in a plurality of useful modes, the oscillatory micromechanical system including at least one system component, which is excitable in at least one parasitic spurious mode by a superposition of the useful modes. An adjusting device is provided, which is configured in such a way that it counteracts the parasitic spurious mode by application of an electromagnetic interaction to the system component.

MEMS device including spurious mode suppression and corresponding operating method

A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Three-axis micromechanical rotation rate sensor system including linearly and rotatorily drivable sensor units

A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.

One-axis and two-axis rotation rate sensor

A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Micromechanical rotational rate sensor system and corresponding production method

A micromechanical rate-of-rotation sensor includes a first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive beam arranged along the first Coriolis element. The first drive beam is coupled via a first spring to the first Coriolis element. The micromechanical rate-of-rotation sensor further includes a first drive electrode carrier extending from the first drive beam in a direction opposite to the first Coriolis element. The first drive electrode carrier is configured to carry a multiplicity of first drive electrodes extending parallel to the first drive beam.

Micromechanical yaw rate sensor and method for operating same

A micromechanical yaw rate sensor includes a substrate and a rotationally oscillating mass having a rotationally oscillating mass bearing. The rotationally oscillating mass bearing includes a rocker bar, a rocker spring rod which resiliently connects the rocker bar to the substrate, and two support spring rods which resiliently connect, on opposite sides of the rocker spring rod, the rocker bar to the rotationally oscillating mass.

Micromechanical yaw rate sensor and method for the production thereof

A rotation rate sensor includes a substrate having a main extension plane and multiple seismic masses, in which for each seismic mass the following applies: the seismic mass is drivable at a drive oscillation, which occurs along a drive direction situated parallel to the main extension plane, the seismic mass is deflectable along two different deflection directions, each direction being perpendicular to the drive direction, the rotation rate sensor being configured to generate detection signals as a function of detected deflections of the seismic masses, one detection signal of the detection signals being associated with each deflection direction of the seismic masses, the rotation rate sensor being configured so that a linear, rotational and centrifugal acceleration of the rotation rate sensor are compensated with respect to at least one rotation axis of the rotation rate sensor through compensation in each case of two corresponding detection signals of the detection signals.

Vibration-resistant rotation rate sensor

A yaw-rate sensor having a substrate and a plurality of movable substructures that are mounted over a surface of the substrate, the movable substructures being coupled to a shared, in particular, central spring element, means being provided for exciting the movable substructures into a coupled oscillation in a plane that extends parallel to the surface of the substrate, the movable substructures having Coriolis elements, means being provided for detecting deflections of the Coriolis elements induced by a Coriolis force, a first Coriolis element being provided for detecting a yaw rate about a first axis, a second Coriolis element being provided for detecting a yaw rate about a second axis, the second axis being oriented perpendicularly to the first axis.

Yaw-rate sensor

For the targeted influencing of the internal pressure within a cavity between two elements of a component, a getter material or an outgassing material is situated in an additional cavity between the two elements. After the two elements are bonded to one another, the additional cavity is still to be joined via a connecting opening to the cavity. The getter material or the outgassing material is then activated so that gasses are bound in the additional cavity and in the connected cavity, or an outgassing takes place. Only when the sought internal pressure has established itself in the connected cavity is the connecting opening to the additional cavity closed. In this way, the getter material or the outgassing material is only used for establishing a defined internal pressure, but no longer has any influence on the internal pressure within the cavity during ongoing operation of the component.

Component including two semiconductor elements between which at least two hermetically tightly sealed cavities having different internal pressures are formed and method for manufacturing such a component

A yaw rate sensor includes a drive mass element which is situated above a surface of a substrate and is drivable to vibrate by a drive device along a first axis extending along the surface, having a detection mass element, which is deflectable under the influence of a Coriolis force along a second axis perpendicular to the surface, and having a detection device by which the deflection of the detection mass element along the second axis is detectable. Due to the arrangement of the second axis perpendicular to the surface, the yaw rate sensor may be integrated into a chip together with additional yaw rate sensors suitable for detection of rotations about axes of rotation in other directions.

Yaw rate sensor

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Reinhard Neul