Forschungszentrum Julich Gmbh

Forschungszentrum Juelich Gmbh

Evonik Degussa Gmbh

Reinhard Carius

Stephan Wieber

Patrik Stenner

Friedhelm Finger

Yaohua Mai

Stefan Klein

Matthias Patz

Dzmitry Hrunski

Andrew Paolo Cadiz Bedini

Michael Cölle

Benjamin Klingebiel

Stefan Haas

Stefan Muthmann

Peter Notten

Aad Gordijn

Jan Flohre

Markus Huelsbeck

Chunguang Chen

Torsten Bronger

Michael CÖLLE

Markus Hülsbeck

Hydrogenated amorphous silicon-containing colloids or composite colloids have a silicon-containing shell which surrounds the hollow colloids or composite colloids. The colloids have a spherical geometry. The silicon-containing composite colloids have a spherical geometry and a diameter of between 2 nm and 7 nm in scanning electron micrographs, and the silicon-containing colloids have a spherical geometry with a cavity and a diameter of between 50 and 200 nm in scanning transmission electron micrographs. The cavity is surrounded by a shell with a thickness of between 3 and 10 nm.

Method for producing hydrogenated amorphous silicon-containing colloids and/or composite colloids and for encapsulating substances with hydrogenated amorphous silicon-containing composite colloids, hydrogenated amorphous silicon-containing colloids and/or composite colloids, substances encapsulated with silicon-containing composite layers, and use thereof

A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode with a substrate support for holding a substrate, wherein a high-frequency alternating field for generating the plasma can be formed between the RF electrode and the counter-electrode. The chamber comprising an RF electrode with an optical feedthrough. A method, for in situ analysis or in situ processing of a layer or plasma in a plasma chamber, wherein the layer is disposed on counter-electrode and an RF electrode is disposed on the side lacing the layer. Selection of an RF electrode having an optical feedthrough, and at least one step in which electromagnetic radiation is supplied through the optical feedthrough for purposes of analysis or processing of the layer or the plasma, and by at least one other step in which the scattered or emitted or reflected radiation is supplied to an analysis unit.

Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ

The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiH(with a=3-10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500-900&#xb0; C. and a conversion time of &#x2266;5 minutes. The invention also relates to silicon layers producible according to said method and to their use.

Method for producing silicon layers

A thin film solar cell is disclosed comprising the following layers deposited on a substrate:

Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence

The invention relates to a method for production of a thin-layer solar cell with microcrystalline silicon and a layer sequence. According to the invention, a microcrystalline silicon layer is applied to the lower p- or n-layer in pin or nip thin-layer solar cells, by means of a HWCVD method before the application of the microcrystalline i-layer. The efficiency of the solar cell is hence increased by up to 0.8% absolute.

Growing community of inventors

Juelich, Germany

Reinhard Carius