Basf Aktiengesellschaft

Reinhard Aldag

Peter Neumann

Andreas Boettcher

Thomas Bluemel

Friedrich Seitz

Martin Fischer

Friedrich-Wilhelm Raulfs

Poly-N-vinylcarbazole containing impurities is purified by a process in which the poly-N-vinylcarbazole to be purified is treated in a suitable apparatus at from 20.degree. to 150.degree. C. with an extracting agent.

Purification of poly(n-vinylcarbazole) containing impurities

Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain benzotriazole compound as a sensitizer and optionally further additive and/or auxiliary substances.

Photopolymerizable recording materials containing a triazole sensitizer

Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain 4-phenylpyridine as sensitizer and optionally further additive and/or auxiliary substances.

Photopolymerizable recording materials and photoresist layers and

Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, novel 4-quinazolone compounds as sensitizers and optionally further additive and/or auxiliary substances.

4-Quinazolone compounds

Abstract of the disclosure: Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, novel 4-quinazolone compounds as sensitizers of the formula (I) ##STR1##

Photopolymerizable recording materials, photoresist layers and

Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system

An optical recording material possesses a light-absorbing layer on a base, the said layer containing one or more colorants of the formula (I) ##STR1## where M is two hydrogen atoms or Fe, Cu, Co, Ni, Pb, Cr, Mn, VO, TiO, ZrO, Nb, Ta, Pd, SiCl.sub.2, Sn or SnX.sub.2, X is Cl, Br or I, and A is a divalent radical of an unsaturated, unsubstituted or substituted carbocyclic ring system. The colorants (I) present on the novel recording materials have a high absorption in the range from 650 to 850 nm and accordingly can be written on and read by means of a laser. The colorants can be applied as 20-1000 nm layers on a suitable base by vapor deposition or as a solution or dispersion, with or without the addition of a polymeric binder, by a conventional method. The layers are very stable to atmospheric influences and daylight.

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Ludwigshafen, Germany

Reinhard Aldag