Leybold-heraeus Gmbh & Co. Kommandit-gesellschaft

Reiner Wechsung

Jurgen Kirschner

A method for controlling the removal, by means of ion etching, of a thin layer or regions of the layer as determined by masks, from a substrate of a sample which has a chemical composition different than that of the layer to be removed. During the ion etching process, an electrical signal which changes after the removal of the thin layer is derived from the substrate or from its mount, or from an electrode disposed in the vicinity of said substrate and this electrical signal is utilized to control an arrangement which influences the ion bombardment of the surface of the sample.

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Cologne, Germany

Reiner Wechsung