Air Products and Chemicals, Inc.

Versum Materials Us, LLC

Reinaldo Mario Machado

Mark Leonard O'Neill

Dnyanesh Chandrakant Tamboli

Hongjun Zhou

Krishna P Murella

John Edward Quincy Hughes

Xiaobo Shi

David Joseph Parrillo

Richard Peter Boehme

Christopher L Hartz

Francis Joseph Waller

William Edward Starner

Andrew Francis Nordquist

Jo-Ann Theresa Schwartz

Frederick Carl Wilhelm

Bernard A Toseland

James Joseph Hart

Malcolm Grief

Robert Roger Broekhuis

Krishnakumar Jambunathan

Anthony Rocco Cartolano

Steven Charles Winchester

George L Ryals

Keith Allen Welp

Sylvia Caram

Andrew J Dodd

James E Hollen

Rebecca J Mohr

Ronald Martin Pearlstein

John E Dewhurst

John Anthony Marsella

Howard P Withers, Jr

Matthias Stender

Kerry R Berger

Brian E Farrell

James Patrick Nehlsen

Sai-Hong Andrew Lo

Athanasios Georgios Tsirukis

James Robert Leenhouts

Steven Arnold Krouse

Daniel James Ragsdale

James Edward Koniski

William F Schulze

Stephen Kohler

Chun Lu

Albert J Siuta

Edward Jay Cialkowski

Thomas W Panunto

Kerry Renard Berger

Mark Leonard O'neill

This invention pertains to slurries, methods and systems that can be used in chemical mechanical planarization (CMP) of tungsten containing semiconductor device. Using the CMP slurries with additives to counter lowering of pH by tungsten polishing byproducts and maintain pH 4 or higher, the erosion of dense metal (such as tungsten) structures can be greatly diminished.

Tungsten chemical mechanical polishing for reduced oxide erosion

Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

Composite particles, method of refining and use thereof

Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.

Composite abrasive particles for chemical mechanical planarization composition and method of use thereof

This invention is an apparatus and a method for continuously generating a hydride gas of Mwhich is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M, the anode chamber has an anode comprising Mand is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide MOH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. Mcan be selenium, phosphorous, silicon, metal or metal alloy, Mis metal or metal alloy suitable for anionic oxygen generation, and Mis NHor an alkali or alkaline earth metal.

Divided electrochemical cell and low cost high purity hydride gas production process

An electrolytic cell which is partitioned into one or more anode chambers and cathode chambers by one or more partition walls between each anode chamber and cathode chamber, wherein each anode chamber comprises one or more anodes comprising an inner surface and an outer surface, and each cathode chamber comprises one or more cathodes, wherein the anode chamber and the cathode chamber are configured such that any one of the one or more cathodes is adjacent to the outer surface of the one or more anodes and there is no cathode adjacent to the inner surface of the one or more anodes; a molten salt electrolyte surrounding the one or more anodes and the one or more cathodes; at least one anode gas outlet for withdrawing gas from the anode chamber; and at least one cathode gas outlet for withdrawing gas from the cathode chamber.

Electrolytic apparatus, system and method for the efficient production of nitrogen trifluoride

An electrolytic cell and system used for making nitrogen trifluoride consisting of a computer and an electrolytic cell having a body, an electrolyte, at least one anode chamber that produces an anode product gas, at least one cathode chamber, and one or more fluorine adjustment means to maintain fluorine or hydrogen in the anode product gas within a target amount by adjusting the concentration of fluorine in said anode product gas, and the process that controls the system.

Electrolytic apparatus, system and method for the safe production of nitrogen trifluoride

A method for generating hydride gas of metal Min electrochemical cell comprising cathode comprising metal M, sacrificial anode comprising metal M, an initial concentration of aqueous electrolyte solution comprising metal hydroxide MOH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution to form metal salt, and hydride gas of metal Mis formed by reducing the metal Mof the cathode. The method also comprises steps of determining solubility profile curves of metal salt as MOH is consumed and metal oxide is formed by oxidation reaction at various concentrations of MOH; determining the maximum concentration of MOH that does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of MOH that is in the range of at and within 5% less than the maximum concentration of MOH to be the initial concentration of MOH.

Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V hydrides

The invention relates to the electrolysis of aqueous electrolyte solutions containing GeO; hydroxide and water with metal alloy electrodes, such as, copper or tin rich alloy electrodes with alloying elements such as Sn, Pb, Zn, Cu etc, to generate Germane (GeH). Cu-rich alloy electrodes have been demonstrated to increase the GeHcurrent efficiency by almost 20% compared to Cu metal electrodes. Germanium deposition has been found to be either absent or minimal by using Cu-rich alloy electrodes. Several different methods for maintaining the cell performance or restoring the cell performance after a reduction in current efficiency over time, have been identified. A titration-based method for the analysis of the electrolyte, to obtain the concentration of GeOand the concentration of hydroxide has also been disclosed.

Electrodes for electrolytic germane process

A method for generating a hydride gas of metal Min an electrochemical cell comprising a cathode comprising metal M, a sacrificial anode comprising metal M, an initial concentration of aqueous electrolyte solution comprising a metal hydroxide, MOH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution comprising MOH to form a metal salt, and the hydride gas of metal Mis formed by reducing the metal Mof the cathode. The method comprises the steps of determining solubility profile curves of the metal salt as the MOH is consumed and the metal oxide is formed by the oxidation reaction at various concentrations of MOH; determining a maximum concentration of MOH that, as it is consumed, does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of MOH that is in the range of at and within 5% less than the maximum concentration of MOH to be the initial concentration of MOH.

The invention pertains to an improved apparatus comprised of a monolith catalytic reactor having an inlet and an outlet and a static mixer having an inlet and an outlet thereto with the outlet of said static mixer in communication with the inlet of said monolith catalytic reactor. The invention also pertains to an improvement in a process for effecting a reaction in the monolith catalytic reactor wherein a reactant gas and reactant liquid are introduced to the inlet to the monolith catalytic reactor, reacted and, then, the reaction product passed through the outlet of the monolith catalytic reactor.

Monolith catalytic reactor coupled to static mixer

This invention relates to apparatus particularly a monolith catalytic reactor in a stirred tank reactor. The stirred tank reactor including the fixed bed catalytic reactor apparatus comprises:

Catalyst holder and agitation system for converting stirred tank reactor to fixed bed reactor

The present invention relates to an improved monolith catalytic reactor and a monolith support. The improvement in the support resides in a polymer network/carbon coating applied to the surface of a porous substrate and a catalytic metal, preferably a transition metal catalyst applied to the surface of the polymer network/carbon coating. The monolith support has from 100 to 800 cells per square inch and a polymer network/carbon coating with surface area of from 0.1 to 15 m /gram as measured by adsorption of N or Kr using the BET method.

Polymer network/carbon layer on monolith support and monolith catalytic reactor

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Allentown, PA, United States of America

Reinaldo Mario Machado