University of Colorado

Rayshan Visvanathan

Gregory Lewis Whiting

Diana Torres Sanchez

Integrated circuit structures, arrangements, and manufacturing processes are discussed herein. In one example, a method of forming a transistor structure includes forming a dielectric layer onto a gate element and forming a corrugated surface into the dielectric layer using at least an atomic layer etching (ALE) process to remove portions of the dielectric layer. The method also includes forming a semiconductor layer onto the corrugated surface and forming a source element and a drain element onto the semiconductor layer.

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Boulder, CO, United States of America

Rayshan Visvanathan