Nanoink, Inc.

Raymond K Eby

Igor Touzov

Michael R Nelson

Mike Nelson

Sylvain Cruchon Dupeyrat

A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.

Method and apparatus for aligning patterns on a substrate

A system and method for calibration of nanolithography includes fabricating a nanoscale test pattern, measuring a parameter of the test pattern, and calculating a calibration coefficient from the measured parameter. The calculated calibration coefficient is then used for nanolithography. Nanolithography can be carried out with nanoscopic tips depositing patterning compounds on a substrate.

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Grayslake, IL, United States of America

Raymond K Eby