The Procter Gamble Company

Dristi, LLC

Ranjit U Chatterjee

Donald Lynn Bissett

Rodney D Bush

Stephen J Kirchner

Rajesh Kapoor

Disclosed are hybrid wound dressings that include at least one front layer of a hydrophilic absorbent material and at least one layer behind the front layer that is made of an open-celled polymeric foam made from high internal phase emulsions (HIPEs). The hydrophilic absorbent material may be a natural polymeric material; a synthetic, non-foam polymer; or a material like glass microfiber. Each layer has a rate of fluid absorption and a capillary suction pressure (CSP) for a working fluid like blood plasma. The CSP increases from the front layer toward the layers behind the front layer, such that fluid is drawn away from a wound.

Hybrid dressings of hydrophilic material and polymer foam

Disclosed are methods for using open-celled polymeric foam wound dressings made from high internal phase emulsions (HIPEs). The wound dressings have a high capillary pressure and may reduce or obviate the need for treatments like negative pressure wound treatment (NPWT). Also disclosed are structures for HIPE foam wound dressings. The HIPE foam wound dressings typically include at least two layers of HIPE foam with different, but homogeneous, average cell sizes. The average cell sizes form a cell size gradient, with cell size typically decreasing from the front or face layer of foam toward the back layer of foam. The back layer of foam may be a collapsed layer, while the front layer or layers may be expanded. Compared with HIPE foams for other absorbent applications, the wound dressing foams may be higher in hydratable salts and higher in initial moisture levels.

Methods for using polymer foam absorbent materials in wound dressings

Disclosed are pharmaceutical compositions comprising a radical scavenging agent and an anti-inflammatory agent which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of a radical scavenging agent, an anti-inflammatory agent, and a sunscreen are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Compositions comprising a radical scavenging compound and an

The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents. Also involved are compositions comprising chelating agents together with anti-inflammatory agents, sunscreening agents, and/or radical scavenging agents. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are also involved.

Photoprotection compositions comprising chelating agents

The present invention provides deodorant compositions for controlling malodor from perspiration comprising a safe an effective amount of a 1,3-diketone compound having the general formula: ##STR1## wherein each W is independently selected from the group consisting of O, S and (CH.sub.2).sub.n, wherein n=1-3; and each X is independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted alkyl having from about 1 to about 5 carbon atoms, or two X moieties are covalently bonded to form a substituted or unsubstituted alkyl, heteroalkyl, aryl or heteroaryl ring having from about 3 to about 12 atoms including from 0 to about 3 heteroatoms in the ring; and a topical carrier; whereby the composition is suitable for topical application to the skin or to articles of clothing worn in the vicinity of the skin. Methods for controlling malodor comprising depositing on skin in the axilla or crotch region, or to articles of clothing worn in the vicinity of the skin of a safe and effective amount of a 1,3-diketone of the present invention, are also provided.

Diketone deodorant composition and method of deodorization

Disclosed are photoprotective compositions comprising a radical scavenging agent and an anti-inflammatory agent which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of a radical scavenging agent, an anti-inflammatory agent, and a sunscreen are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Photoprotection compositions comprising a radical scavenging compound

The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents having the formula ##STR1## wherein --R.sup.1 and --R.sup.2 are independently selected from the group consisting of alkyl, aryl, and heteroaryl, or R.sup.1 and R.sup.2 may be covalently bonded together to form a cyclic alkyl; --M is selected from the group consisting of =0, =S, --SR.sup.4 and --OR.sup.4 (when --M is --OR.sup.4 or --SR.sup.4, there is a hydrogen bonded to the carbon to which --M is bonded); --R.sup.4 is selected from the group consisting of hydrogen, alkyl, aryl and heteroaryl; --R.sup.3 is selected from the group consisting of hydrogen, alkyl, aryl and heteroaryl; --R.sup.6 is selected from the group consisting of hydrogen alkyl, aryl and heteroaryl; and i is selected from the group consisting of one and zero. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are al so involved.

Chelator compositions comprising oxime compounds

The present invnetion relates to a compositon for topical application for regulating wrinkles in mammalian skin comprising a benzofuran derivative having the structure ##STR1## wherein R.sup.1 and R.sup.2 are each independently methyl or ethyl, R.sup.3 is C.sub.1 -C.sub.4 alkyl, y is an integer from 1 to about 3 and each X is independently selected from the group consisting of Cl, Br, I, F, NO.sub.3, NO.sub.4, SO.sub.3 and SO.sub.4, and a safe and effective amount of a topical carrier.

Compositions for regulating skin wrinkles comprising a benzofuran

Disclosed are topical compositions comprising sorbohydroxamic acid with a radical scavenging compound which prevent damage to skin caused UV radiation. Also disclosed is a method for using these compositions topically, to prevent damage to skin caused by UV radiation exposure.

Photoprotection compositions and methods comprising sorbohydroxamic acid

Disclosed are pharmaceutical compositions comprising tocopherol sorbate and an anti-inflammatory agent which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of tocopherol sorbate, an anti-inflammatory agent, and a sunscreen are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Photoprotection compositions comprising tocopherol sorbate and an

Disclosed are pharmaceutical compositions comprising sorbohydroxamic acid, or pharmaceutically-acceptable salts thereof, and an anti-inflammatory agent, which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of sorbohydroxamic acid and an anti-inflammatory agent together with tocopherol sorbate and/or sunscreens are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Photoprotection compositions comprising sorbohydroxamic acid and an

Disclosed are pharmaceutical compositions comprising sorbohydroxamic acid, or pharmaceutically-acceptable salts thereof, which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of sorbohydroxamic acid together with tocopherol sorbate and/or sunscreens are also disclosed. Also disclosed is a method for using these compositions topically, prior to UV exposure, to prevent damage to skin caused by acute or chronic UV exposure.

Growing community of inventors

Fairfield, OH, United States of America

Ranjit U Chatterjee