Globalfoundries Inc.

Rani Ghaida

Swamy Muddu

Swammy Muddu

Methodologies and an apparatus enabling an improvement of a manufacturing yield of an IC design are disclosed. Embodiments include: determining a portion of a layout of an IC design, the portion including a first pattern including a plurality of design connections; determining a function performed by the first pattern based, at least in part, on the design connections; and selecting, by a processor, a second pattern based on the function.

Selection of replacement patterns for reducing manufacturing hotspots and constraint violations of IC designs

Methods and systems for generating a regularized integrated circuit layout are disclosed. Pattern replacement of various portions of wiring within an integrated circuit layout with a common pattern is performed in order to generate a regularized layout. The regularized layout is then subjected to additional mask data preparation processing, such as optical proximity correction.

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San Jose, CA, United States of America

Rani Ghaida