Morton International, Inc.

Morton Thiokol Inc.

Randall M Kautz

Richard M Lazarus

Sunit S Dixit

Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.

High contrast high thermal stability positive photoresists having

Novolak resins of lowered hydroxyl content and high contrast high

Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.

Mixed aldehyde novolak resins useful as high contrast high thermal

Method of forming a thermally stable mixed aldehyde novolak resin

High contrast high thermal stability positive photoresists with mixed

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Irvine, CA, United States of America

Randall M Kautz