Asml Netherlands B.v.

Ramon Navarro Y Koren

Hubertus Johannes Gertrudus Simons

Andre Bernardus Jeunink

Hoite Pieter Theodoor Tolsma

Richard Johannes Franciscus Van Haren

Paul Christiaan Hinnen

Franciscus Bernardus Maria Van Bilsen

Jacobus Burghoorn

Henry Megens

Jeroen Huijbregtse

Sicco Ian Schets

Hermanus Gerardus Van Horssen

Allan Reuben Dunbar

Johny Rutger Schuurhuis

Brian Young Bok Lee

Remi Daniel Marie Edart

Pui Leng Lam

Bernardus Johannes Antonius Hulshof

Roland Adrianus Emanuel Maria Bogers

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Alignment systems and methods for lithographic systems

An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.

Alignment system and method and device manufactured thereby

An alignment system for a lithographic apparatus has a source of alignment radiation that has a first wavelength and a second wavelength; a detection system that has a first wavelength channel arranged to receive alignment radiation from an alignment mark at the first wavelength and a second wavelength channel arranged to receive alignment radiation from the alignment mark at the second wavelength; and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second wavelength channels in combination to determine a position of the alignment mark based on information from the first wavelength channel, information from the second wavelength channel or combined information from the first and second wavelength channels according to a relative strength of the alignment radiation detected at the first wavelength to alignment radiation detected at the second wavelength. A lithographic apparatus includes the above alignment system. Methods of alignment and manufacturing devices use the above alignment system and lithographic apparatus, respectively.

Alignment system and methods for lithographic systems using at least two wavelengths

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Veldhoven, Netherlands

Ramon Navarro Y Koren