Asml Netherlands B.v.

Ramon Mark Hofstra

Markus Franciscus Antonius Eurlings

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Jan Bernard Plechelmus Van Schoot

Gerardus Hubertus Petrus Maria Swinkels

Antonius Johannes Josephus Van Dijsseldonk

Erik Petrus Buurman

Oscar Franciscus Jozephus Noordman

Alexander Matthijs Struycken

Harm-Jan Voorma

Andrey Sergeevich Tychkov

Kevin Weimin Zhang

Niek Antonius Jacobus Maria Kleemans

Sumant Sukdew Ramanujan Oemrawsingh

Jiun-Cheng Wang

Petrus Adrianus Theodorus Maria Ruijs

Peter Frans Maria Muys

Francois Charles Dominique Deneuville

Tien Nang Pham

A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.

Reflective optical element for a radiation beam

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Radiation source

A faceted reflector (&#x2033;) for receiving an incident radiation beam () and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

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Beekbergen, Netherlands

Ramon Mark Hofstra