Continental Teves, Ag and Company Ohg

Vti Technologies Oy

Ramnath Sivaraman

Stefan Günthner

Bernhard Schmid

Roland Hilser

Petri Klemetti

Jasmin Lohmann

A micromechanical rotation rate sensor, including a substrate whose base surface is aligned parallel to the x-y plane of a Cartesian coordinate system, with the rotation rate sensor having at least one first seismic mass and a second seismic mass which are coupled to at least one first drive device and are suspended such that the first and the second seismic masses are driven such that they are deflected in antiphase in one drive mode, with the rotation rate sensor being designed such that it can detect rotation rates about at least two mutually essentially orthogonal sensitive axes, wherein at least the second seismic mass is in the form of a frame which at least partially surrounds the first seismic mass with respect to the position on the x-y plane.

Double-axial, shock-resistant rotation rate sensor with nested, linearly oscillating seismic elements

A micromechanical rotation rate sensor, comprising at least one substrate, wherein the rotation rate sensor has at least a first and a second seismic mass which are coupled to one another by means of at least one coupling beam, and wherein the rotation rate sensor is embodied in such a way that it can detect rotation rates about at least a first and a second sensitive axis, wherein each seismic mass is assigned at least one actuator unit with which the deflection behavior of the seismic mass can be influenced.

Double-axis rotation rate sensor

A method and apparatus for the precise measuring operation of a micromechanical rotation rate sensor, including at least one deflectively suspended seismic mass, at least one drive device for driving the seismic mass, and at least one first and one second trimming electrode element, which are jointly assigned directly or indirectly to the seismic mass, a first electrical trimming voltage (U, U, U) being set between the first trimming electrode element and the seismic mass, and a second electrical trimming voltage (U, U, U) being set between the second trimming electrode element and the seismic mass, the first and the second electrical trimming voltages being set at least as a function of a quadrature parameter (U) and a resonance parameter (U).

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Frankfurt-am-Main, Germany

Ramnath Sivaraman