Asml Netherlands B.v.

U.S. Philips Corporation

Ramin Badie

Raymond Wilhelmus Louis Lafarre

Thibault Simon Mathieu Laurent

Koen Steffens

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Robbert Jan Voogd

Takeshi Kaneko

Bastiaan Andreas Wilhelmus Hubertus Knarren

Gregory Martin Mason Corcoran

Gerardus Adrianus Antonius Maria Kusters

Johan Frederik Dijksman

Dzmitry Labetski

Vadim Yevgenyevich Banine

Nicolaas Ten Kate

Hans Jansen

Michel Riepen

Hendrikus Gijsbertus Schimmel

Antonius Theodorus Wilhelmus Kempen

Johannes Christiaan Leonardus Franken

Ronald Johannes Hultermans

Henricus Jozef Castelijns

Reinier Theodorus Martinus Jilisen

Wilbert Jan Mestrom

Albert Pieter Rijpma

Dennis Jozef Maria Paulussen

Peter Van Putten

Jacob Brinkert

Gerrit Van Der Straaten

Jan Okke Nieuwenkamp

Wim Ronald Kampinga

Brian Vernon Virgo

Harmeet Singh

Koen Jacobus Johannes Maria Zaal

Theodorus Petrus Maria Cadee

Andrei Mikhailovich Yakunin

Hendrikus Robertus Marie Van Greevenbroek

Koen Gerhardus Winkels

Adrianus Cornelius Van Kasteren

Martin Fleuster

Johannes A De Wit

Johan F Dijksman

Johannes Van Zwol

Marcel J Damen

Andreas C Van Nes

Joseph R Pankert

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Lithographic apparatus and method

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.

Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing method

The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.

A radiation source (e.g., LPP&#x2014;laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

Method and apparatus for generating radiation

A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.

Lithographic apparatus comprising a support for holding an object, and a support for use therein

A printhead which comprises a body with pressure chambers (13) and nozzles (14), a membrane (17) connected to the body so as to form one wall of the pressure chambers, and an actuator plate (25) comprising an actuator element (31) for each pressure chamber. A support plate (19) between the actuator plate and the membrane includes first portions (21) and second portions (23) with the first portions being movable relative to the second portions in the direction of the thickness of the support plate, a first portion being situated between each actuator element and the corresponding pressure chamber. The actuator plate has active regions (31) and inactive regions (33), the actuator elements being formed by active regions of the actuator plate. Adjacent actuator elements are separated from each other over substantially their whole length by slits (35) in the actuator plate. The actuator plate can be a ceramic multilayer actuator (CMA).

Ink jet printhead and ink jet printer

Growing community of inventors

Eindhoven, Netherlands

Ramin Badie