Brewer Science, Inc.

Ramachandran K Trichur

Gary J Brand

Philip H Allen

Tony D Flaim

Tingji Tang

Xing-Fu Zhong

Gu Xu

Wenbin Hong

Kimberly Yess

Phillip H Allen

New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.

Acid-etch resistant, protective coatings

New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

Device for coating the outer edge of a substrate during microelectronics manufacturing

Process and device for coating the outer edge of a substrate during microelectronics manufacture

Growing community of inventors

Rolla, MO, United States of America

Ramachandran K Trichur