Goji Limited

Ram Elboim

Zalman Ibragimov

Amit Rappel

Avner Libman

Itzhak Chaimov

Sharon Hadad

Maksim Berezin

Ben Zickel

Ronen Cohen

Amir Burnstein

Hertzel Yehezkely

Coby Maron

Apparatus for processing an object includes a cavity for receiving therein the object. A plurality of processing antennas are configured to coherently feed the cavity with RF radiation generated by a processing RF source. A memory stores processing instructions for each object from a given group of objects. A user interface is configured to receive identification of an object to be processed from a user. A processor is configured to receive from the interface indication of the identification of the object, select a processing instruction based on the indication, and control the processing RF source to radiate according to the selected processing instruction. The energy processing instruction includes a plurality of excitation setups, each excitation setup of said plurality of excitation setups including amplitudes, each of which is associated with one of the plurality of antennas, and one or more phase differences associated with each two antennas associated with non-zero amplitudes.

Apparatus and method for sensing and processing by RF

A method includes processing an object in a cavity by applying radio frequency (RF) energy to the cavity. A first plurality of frequencies is identified, characterized in that a time derivative of a value indicative of a dielectric response of the cavity to RF energy at frequency of the first plurality of frequencies is larger than a first threshold. More energy is applied at frequencies of the first plurality of frequencies than at other frequencies.

Applying RF energy according to time variations in EM feedback

A disclosed apparatus for sensing and processing an object in a cavity () comprises a sensing RF source () and a sensing antenna (), and a processing RF source () and a processing antenna (). The sensing RF source is configured to generate low power RF radiation at a first frequency range and the sensing antenna is configured to feed the cavity with RF radiation generated by the low power RF source. The processing RF source is configured to generate high power RF radiation at a second frequency range, and the processing antenna is configured to feed the cavity with RF radiation generated by the processing RF source. A protecting system () configured to protect the sensing RF source from RF radiation generated by the processing RF source may be provided.

An apparatus for applying RF energy to process an object may include at least one controller configured to receive EM feedback-related values from an energy application zone, each of the values being associated with a respective MSE. The controller may also be configured to identify a change in one or more of the EM feedback-related values within a period of time; adjust the RF energy application based on the change in the EM feedback-related values identified, and cause application of RF energy to the energy application zone.

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Modiin, Israel

Ram Elboim