Lawrence Livermore National Security, LLC

Raluca A Negres

Stavros G Demos

Alexander M Rubenchik

Jeffrey Devin Bude

John Edward Heebner

Gabriel Mark Guss

Gabe Guss

Thomas M Spinka

Maurice B Aufderheide

Scott C Wilks

Craig W Siders

Steven T Yang

Sonny S Ly

Nan Shen

David A Alessi

Wade H Williams

Wesley John Keller

Andreas J Kemp

Otto L Landen

Rajesh Raman

Andrew J Mackinnon

The present disclosure relates to a laser system for processing a material. The system may make use of a laser configured to intermittently generate a first laser pulse of a first duration and a first average power, at a spot on a surface of the material being processed, and a second laser pulse having a second duration and a second peak power. The second duration may be shorter than the first duration by a factor of at least 100, and directed at the spot. The second laser pulse is generated after the first laser pulse is generated. The first laser pulse is used to heat the spot on the surface of the material, while the second laser pulse induces a melt motion and material ejection of molten material from the melt pool.

Laser drilling and machining enhancement using gated CW and short pulsed lasers

A method for increasing the MeV hot electron yield and secondary radiation produced by short-pulse laser-target interactions with an appropriately high or low atomic number (Z) target. Secondary radiation, such as MeV x-rays, gamma-rays, protons, ions, neutrons, positrons and electromagnetic radiation in the microwave to sub-mm region, can be used, e.g., for the flash radiography of dense objects.

Burst-mode chirped pulse amplification method

A method of determining conditioning pulse parameters for an optical element includes directing a pump pulse to impinge on the optical element and directing a probe pulse to impinge on the optical element. The method also includes determining a first time associated with an onset of electronic excitation leading to formation of an absorbing region of the optical element and determining a second time associated with expansion of the absorbing region of the optical element. The method further includes defining a turn-off time for a conditioning pulse between the first time and the second time. According to embodiments of the present invention, pulse shaping of the conditioning pulse enables laser conditioning of optical elements to achieve improvements in their laser induced damage threshold.

Method and system for processing optical materials for high power laser systems

A method of repairing damage in an optical element includes providing a laser system including at least one optical element having a coating layer having an incident light surface and directing a laser pulse from the laser system to impinge on the incident light surface. The method also includes sustaining damage to a portion of the incident light surface and melting the damaged portion of the incident light surface and a region adjacent to the damaged portion. The method further includes flowing material from the region adjacent the damaged portion to the damaged portion and solidifying the material in the damaged portion and the region adjacent to the damaged portion.

Method and system for high power reflective optical elements

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Pleasanton, CA, United States of America

Raluca A Negres