Infineon Technologies Ag

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Ralph Trunk

Claus Schneider

Lothar Pfitzner

Olaf Storbeck

Heinz Schmid

A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.

Particle measurement configuration and semiconductor wafer processing device with such a configuration

A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.

Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object

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Bischberg, Germany

Ralph Trunk