Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Ralph Pulwey

Josef Biberger

Andreas Adolf

Roland Salzer

Katja Tsyrulin

Volker Wieczorek

Michael Steigerwald

Lorenz Lechner

Rainer Arnold

Jaroslaw Paluszynski

Harald Niebel

Marcin Janaszewski

Klaus Hegele

Michal Postolski

Dietmar Doenitz

Hans Mathèe

Ernst Draszba

A method of raster scanning a surface of an object using a particle beam comprises determining a basic set of raster points within a surface; determining a surface portion of the surface of the object, wherein the surface portion is to be raster scanned; ordering a set of raster points of the basic set located within the surface portion; and scanning of the surface portion by directing the particle beam onto the raster points of the ordered set in an order corresponding to an order of the raster points in the ordered set from the outside to the inside, i.e. starting from the boundary of the surface portion towards its center, or in the reverse order, i.e. from the inside to the outside.

Methods and systems for raster scanning a surface of an object using a particle beam

Processes may be performed with a plurality of FIB-SEM systems. A first process group includes recording an image with the electron beam column, depositing material with supply of a process gas, and performing ion beam etching. A second process group includes performing a sample exchange, exchanging a reservoir of a gas source for the process gas, and verifying an image that was recorded with the electron beam column. The processes of the second group are prioritized. The FIB-SEM systems are actuated to work through processes contained in process lists. If in a plurality of FIB-SEM systems processes of the second group are to be performed simultaneously, an instruction based on the prioritization is output to the user.

Method for operating a plurality of FIB-SEM systems

A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of the scan lines. The first scanning direction is changed to a second scanning direction at a change-of-direction time. Changing from the first scanning direction to the second scanning direction comprises setting of a point of rotation in that scan line of the scan region in which the particle beam is situated at the change-of-direction time, with an axis of rotation extending through the point of rotation. The first scanning direction is changed into the second scanning direction by rotating the scan region about the axis of rotation, with the point of rotation being selected dependent on the direction of rotation.

Method for processing and/or for observing an object, and particle beam device for carrying out the method

The application relates to a method for analyzing, in particular for imaging, and/or processing of an object as well as a particle beam device for carrying out this method. In particular, the particle beam device of this application is an electron beam device and/or an ion beam device. The method in particular comprises the control unit providing a first control parameter, wherein a beam guiding unit is controlled using the first control parameter for guiding the particle beam and/or wherein a moving unit is controlled using the first control parameter for moving an object holder, correlating a position of the object holder in a second coordinate system to the object position on the surface of the object, identifying a first coordinate transformation between the first coordinate system and the second coordinate system, identifying an orientation position of a distinctive feature on the surface of the object and identifying first coordinates of the orientation position in the first coordinate system, the control unit providing a second control parameter, wherein the second control parameter is used for at least one of: controlling the beam guiding unit for guiding the particle beam, controlling the moving unit for moving the object holder or controlling a detector, identifying again the orientation position of the distinctive feature and identifying second coordinates of the orientation position in the first coordinate system, comparing the first coordinates with the second coordinates, identifying a local displacement of the first coordinates to the second coordinates, identifying a second coordinate transformation using the first coordinate transformation and the local displacement and identifying a position of an area to be analyzed and/or processed on the surface of the object.

Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method

A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.

Particle beam device having a sample holder

A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.

Method and apparatus for scanning a surface of an object using a particle beam

A particle beam system includes a charged particle beam source, a beam blanking module connectable to a data network, a focusing lens, a first beam deflection module connectable to the data network, a calculation module configured to determine a deflection time; and an encoding module.

Particle beam system and method for operating the same

An ion beam system comprises a voltage supply systemand at least one beam deflectorhaving at least one first deflection electrodeand plural second deflection electrodes, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Ion beam system and method of operating an ion beam system

A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.

Method of processing of an object

A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates, and a control circuit. The control circuit provides a first current pathbetween the two deflection plates, wherein a switch, a nodeconnected to the high voltage source and a switchare arranged in this order in the first current path starting from the deflection plate. The control circuit provides a second current pathbetween the deflection plateand the deflection plate, wherein in the second current path, starting from the deflection plate, a series connectioncomprising a voltage sourcea switch, a nodeconnected to the high voltage source and a series connectioncomprising a voltage sourceand a switchare arranged in this order.

Particle beam system

A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.

An ion beam system comprises a voltage supply systemand at least one beam deflectorhaving a plurality of first defection electrodesand a plurality of second deflection electrodeswherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

Ion beam system and method of operating ion beam system

A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

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Aalen, Germany

Ralph Pulwey