Carl Zeiss Sms Ltd.

Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Ralph Klaesges

Markus Mengel

Sergey Oshemkov

Ulrich Wegmann

Vladimir Dmitriev

Joachim Stuehler

Uwe Schellhorn

Guy Ben-Zvi

Eitan Zait

Steven Labovitz

Vladimir Kruglyakov

A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.

Controllable transmission and phase compensation of transparent material

Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.

Method and apparatus for modifying a substrate surface of a photolithographic mask

In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moir&#xe9; patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles. The object pattern and the image pattern are coordinated with one another in such a way that, when the object pattern is projected onto the image pattern with the aid of the imaging system, images of the sub-gratings of the object pattern superimpose in each case with assigned sub-gratings of the image pattern, accompanied by the generation of moir&#xe9; sub-patterns, which are likewise present in the form of cells situated next to one another. As a result, it is possible simultaneously to determine distortion components for a plurality of image directions aligned transverse to one another. It is preferred to use phase-shift methods in order to evaluate the moir&#xe9; sub-pattern.

Moire method and measuring system for measuring the distortion of an optical imaging system

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Aalen, Germany

Ralph Klaesges